Molaei, R., Bayati, R., Wu, F., Narayan, J. (2014) A microstructural approach toward the effect of thickness on semiconductor-to-metal transition characteristics of VO2 epilayers. Journal of Applied Physics, 115 (16). 164311pp. doi:10.1063/1.4872030
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | A microstructural approach toward the effect of thickness on semiconductor-to-metal transition characteristics of VO2 epilayers | ||
Journal | Journal of Applied Physics | ||
Authors | Molaei, R. | Author | |
Bayati, R. | Author | ||
Wu, F. | Author | ||
Narayan, J. | Author | ||
Year | 2014 (April 28) | Volume | 115 |
Issue | 16 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.4872030Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5196625 | Long-form Identifier | mindat:1:5:5196625:2 |
GUID | 0 | ||
Full Reference | Molaei, R., Bayati, R., Wu, F., Narayan, J. (2014) A microstructural approach toward the effect of thickness on semiconductor-to-metal transition characteristics of VO2 epilayers. Journal of Applied Physics, 115 (16). 164311pp. doi:10.1063/1.4872030 | ||
Plain Text | Molaei, R., Bayati, R., Wu, F., Narayan, J. (2014) A microstructural approach toward the effect of thickness on semiconductor-to-metal transition characteristics of VO2 epilayers. Journal of Applied Physics, 115 (16). 164311pp. doi:10.1063/1.4872030 | ||
In | (2014, April) Journal of Applied Physics Vol. 115 (16) AIP Publishing |
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