Kim, Jaehwan, Min, Daehong, Jang, Jongjin, Lee, Kyuseung, Chae, Sooryong, Nam, Okhyun (2014) Strain relaxation of thick (11–22) semipolar InGaN layer for long wavelength nitride-based device. Journal of Applied Physics, 116 (16). 163109pp. doi:10.1063/1.4900738
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Strain relaxation of thick (11–22) semipolar InGaN layer for long wavelength nitride-based device | ||
Journal | Journal of Applied Physics | ||
Authors | Kim, Jaehwan | Author | |
Min, Daehong | Author | ||
Jang, Jongjin | Author | ||
Lee, Kyuseung | Author | ||
Chae, Sooryong | Author | ||
Nam, Okhyun | Author | ||
Year | 2014 (October 28) | Volume | 116 |
Issue | 16 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.4900738Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5199249 | Long-form Identifier | mindat:1:5:5199249:7 |
GUID | 0 | ||
Full Reference | Kim, Jaehwan, Min, Daehong, Jang, Jongjin, Lee, Kyuseung, Chae, Sooryong, Nam, Okhyun (2014) Strain relaxation of thick (11–22) semipolar InGaN layer for long wavelength nitride-based device. Journal of Applied Physics, 116 (16). 163109pp. doi:10.1063/1.4900738 | ||
Plain Text | Kim, Jaehwan, Min, Daehong, Jang, Jongjin, Lee, Kyuseung, Chae, Sooryong, Nam, Okhyun (2014) Strain relaxation of thick (11–22) semipolar InGaN layer for long wavelength nitride-based device. Journal of Applied Physics, 116 (16). 163109pp. doi:10.1063/1.4900738 | ||
In | (2014, October) Journal of Applied Physics Vol. 116 (16) AIP Publishing |
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