Upadhyay, J., Im, Do, Popović, S., Valente-Feliciano, A.-M., Phillips, L., Vušković, L. (2015) Etching mechanism of niobium in coaxial Ar/Cl2 radio frequency plasma. Journal of Applied Physics, 117 (11). 113301pp. doi:10.1063/1.4914298
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Etching mechanism of niobium in coaxial Ar/Cl2 radio frequency plasma | ||
Journal | Journal of Applied Physics | ||
Authors | Upadhyay, J. | Author | |
Im, Do | Author | ||
Popović, S. | Author | ||
Valente-Feliciano, A.-M. | Author | ||
Phillips, L. | Author | ||
Vušković, L. | Author | ||
Year | 2015 (March 21) | Volume | 117 |
Issue | 11 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.4914298Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5200629 | Long-form Identifier | mindat:1:5:5200629:2 |
GUID | 0 | ||
Full Reference | Upadhyay, J., Im, Do, Popović, S., Valente-Feliciano, A.-M., Phillips, L., Vušković, L. (2015) Etching mechanism of niobium in coaxial Ar/Cl2 radio frequency plasma. Journal of Applied Physics, 117 (11). 113301pp. doi:10.1063/1.4914298 | ||
Plain Text | Upadhyay, J., Im, Do, Popović, S., Valente-Feliciano, A.-M., Phillips, L., Vušković, L. (2015) Etching mechanism of niobium in coaxial Ar/Cl2 radio frequency plasma. Journal of Applied Physics, 117 (11). 113301pp. doi:10.1063/1.4914298 | ||
In | (2015, March) Journal of Applied Physics Vol. 117 (11) AIP Publishing |
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