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Upadhyay, J., Im, Do, Popović, S., Valente-Feliciano, A.-M., Phillips, L., Vušković, L. (2015) Etching mechanism of niobium in coaxial Ar/Cl2 radio frequency plasma. Journal of Applied Physics, 117 (11). 113301pp. doi:10.1063/1.4914298

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Reference TypeJournal (article/letter/editorial)
TitleEtching mechanism of niobium in coaxial Ar/Cl2 radio frequency plasma
JournalJournal of Applied Physics
AuthorsUpadhyay, J.Author
Im, DoAuthor
Popović, S.Author
Valente-Feliciano, A.-M.Author
Phillips, L.Author
Vušković, L.Author
Year2015 (March 21)Volume117
Issue11
PublisherAIP Publishing
DOIdoi:10.1063/1.4914298Search in ResearchGate
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Mindat Ref. ID5200629Long-form Identifiermindat:1:5:5200629:2
GUID0
Full ReferenceUpadhyay, J., Im, Do, Popović, S., Valente-Feliciano, A.-M., Phillips, L., Vušković, L. (2015) Etching mechanism of niobium in coaxial Ar/Cl2 radio frequency plasma. Journal of Applied Physics, 117 (11). 113301pp. doi:10.1063/1.4914298
Plain TextUpadhyay, J., Im, Do, Popović, S., Valente-Feliciano, A.-M., Phillips, L., Vušković, L. (2015) Etching mechanism of niobium in coaxial Ar/Cl2 radio frequency plasma. Journal of Applied Physics, 117 (11). 113301pp. doi:10.1063/1.4914298
In(2015, March) Journal of Applied Physics Vol. 117 (11) AIP Publishing


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