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Chuang, Claire Y., Sattler, Andreas, Sinno, Talid (2015) Thermodynamic and morphological analysis of large silicon self-interstitial clusters using atomistic simulations. Journal of Applied Physics, 117 (13). 135706pp. doi:10.1063/1.4917049

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Reference TypeJournal (article/letter/editorial)
TitleThermodynamic and morphological analysis of large silicon self-interstitial clusters using atomistic simulations
JournalJournal of Applied Physics
AuthorsChuang, Claire Y.Author
Sattler, AndreasAuthor
Sinno, TalidAuthor
Year2015 (April 7)Volume117
Issue13
PublisherAIP Publishing
DOIdoi:10.1063/1.4917049Search in ResearchGate
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Mindat Ref. ID5200810Long-form Identifiermindat:1:5:5200810:2
GUID0
Full ReferenceChuang, Claire Y., Sattler, Andreas, Sinno, Talid (2015) Thermodynamic and morphological analysis of large silicon self-interstitial clusters using atomistic simulations. Journal of Applied Physics, 117 (13). 135706pp. doi:10.1063/1.4917049
Plain TextChuang, Claire Y., Sattler, Andreas, Sinno, Talid (2015) Thermodynamic and morphological analysis of large silicon self-interstitial clusters using atomistic simulations. Journal of Applied Physics, 117 (13). 135706pp. doi:10.1063/1.4917049
In(2015, April) Journal of Applied Physics Vol. 117 (13) AIP Publishing

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Kapur, Sumeet S., Sinno, Talid (2008) Entropic origins of stability in silicon interstitial clusters. Applied Physics Letters, 93 (22). 221911pp. doi:10.1063/1.3042096
Kapur, Sumeet S., Nieves, Alex M., Sinno, Talid (2010) Detailed microscopic analysis of self-interstitial aggregation in silicon. II. Thermodynamic analysis of single clusters. Physical Review B, 82 (4) doi:10.1103/physrevb.82.045206
Luo, Jinping, Alateeqi, Abdullah, Liu, Lijun, Sinno, Talid (2017) Atomistic simulations of carbon diffusion and segregation in liquid silicon. Journal of Applied Physics, 122 (22). 225705pp. doi:10.1063/1.5006944
Chuang, Claire Y., Li, Qiming, Leonhardt, Darin, Han, Sang M., Sinno, Talid (2013) Atomistic analysis of Ge on amorphous SiO2 using an empirical interatomic potential. Surface Science, 609. 221-229 doi:10.1016/j.susc.2012.12.013
Chuang, Claire Y., Han, Sang M., Zepeda-Ruiz, Luis A., Sinno, Talid (2015) On coarse projective integration for atomic deposition in amorphous systems. The Journal of Chemical Physics, 143 (13). 134703pp. doi:10.1063/1.4931991
Kapur, Sumeet S., Sinno, Talid (2010) Detailed microscopic analysis of self-interstitial aggregation in silicon. I. Direct molecular dynamics simulations of aggregation. Physical Review B, 82 (4) doi:10.1103/physrevb.82.045205
Prasad, Manish, Sinno, Talid (2002) Atomistic-to-continuum description of vacancy cluster properties in crystalline silicon. Applied Physics Letters, 80 (11). 1951-1953 doi:10.1063/1.1461050
Sinno, Talid, Jiang, Z. Kurt, Brown, Robert A. (1996) Atomistic simulation of point defects in silicon at high temperature. Applied Physics Letters, 68 (21). 3028-3030 doi:10.1063/1.115566
Käshammer, Peter, Sinno, Talid (2015) A mechanistic study of impurity segregation at silicon grain boundaries. Journal of Applied Physics, 118 (9). 95301pp. doi:10.1063/1.4929637
Frewen, Thomas A., Sinno, Talid (2006) Vacancy self-trapping during rapid thermal annealing of silicon wafers. Applied Physics Letters, 89 (19). 191903pp. doi:10.1063/1.2385069
 
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