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Zhang, Yiting, Zafar, Abdullah, Coumou, David J., Shannon, Steven C., Kushner, Mark J. (2015) Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas. Journal of Applied Physics, 117 (23). 233302pp. doi:10.1063/1.4922631

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Reference TypeJournal (article/letter/editorial)
TitleControl of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas
JournalJournal of Applied Physics
AuthorsZhang, YitingAuthor
Zafar, AbdullahAuthor
Coumou, David J.Author
Shannon, Steven C.Author
Kushner, Mark J.Author
Year2015 (June 21)Volume117
Issue23
PublisherAIP Publishing
DOIdoi:10.1063/1.4922631Search in ResearchGate
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Mindat Ref. ID5201988Long-form Identifiermindat:1:5:5201988:9
GUID0
Full ReferenceZhang, Yiting, Zafar, Abdullah, Coumou, David J., Shannon, Steven C., Kushner, Mark J. (2015) Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas. Journal of Applied Physics, 117 (23). 233302pp. doi:10.1063/1.4922631
Plain TextZhang, Yiting, Zafar, Abdullah, Coumou, David J., Shannon, Steven C., Kushner, Mark J. (2015) Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas. Journal of Applied Physics, 117 (23). 233302pp. doi:10.1063/1.4922631
In(2015, June) Journal of Applied Physics Vol. 117 (23) AIP Publishing

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Logue, Michael D., Kushner, Mark J. (2015) Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power. Journal of Applied Physics, 117 (4). 43301pp. doi:10.1063/1.4904935
Qu, Chenhui, Lanham, Steven J., Shannon, Steven C., Nam, Sang Ki, Kushner, Mark J. (2020) Power matching to pulsed inductively coupled plasmas. Journal of Applied Physics, 127 (13) 133302pp. doi:10.1063/5.0002522
Poulose, John, Goeckner, Matthew, Shannon, Steven, Coumou, David, Overzet, Lawrence (2017) Driving frequency fluctuations in pulsed capacitively coupled plasmas. The European Physical Journal D, 71. doi:10.1140/epjd/e2017-80096-7
Wang, Mingmei, Kushner, Mark J. (2010) High energy electron fluxes in dc-augmented capacitively coupled plasmas I. Fundamental characteristics. Journal of Applied Physics, 107 (2). 23308pp. doi:10.1063/1.3290870
Lanham, Steven J., Kushner, Mark J. (2017) Effects of a chirped bias voltage on ion energy distributions in inductively coupled plasma reactors. Journal of Applied Physics, 122 (8). 83301pp. doi:10.1063/1.4993785
Qu, Chenhui, Lanham, Steven J., Shannon, Steven C., Nam, Sang Ki, Kushner, Mark J. (2020) Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)]. Journal of Applied Physics, 128 (8) 89901pp. doi:10.1063/5.0023888
Diomede, Paola, Economou, Demetre J. (2014) Kinetic simulation of capacitively coupled plasmas driven by trapezoidal asymmetric voltage pulses. Journal of Applied Physics, 115 (23). 233302pp. doi:10.1063/1.4884017
Vasenkov, Alex V., Kushner, Mark J. (2003) Angular anisotropy of electron energy distributions in inductively coupled plasmas. Journal of Applied Physics, 94 (9). 5522-5529 doi:10.1063/1.1614428
Hoekstra, Robert J., Kushner, Mark J. (1996) Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors. Journal of Applied Physics, 79 (5). 2275-2286 doi:10.1063/1.361152
Babaeva, Natalia Y., Kushner, Mark J. (2007) Penetration of plasma into the wafer-focus ring gap in capacitively coupled plasmas. Journal of Applied Physics, 101 (11). 113307pp. doi:10.1063/1.2736333
Babaeva, Natalia Y, Kushner, Mark J (2008) Ion energy and angular distributions into the wafer–focus ring gap in capacitively coupled discharges. Journal of Physics D: Applied Physics, 41. 62004pp. doi:10.1088/0022-3727/41/6/062004
 
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