Krylov, Igor, Pokroy, Boaz, Ritter, Dan, Eizenberg, Moshe (2016) A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs. Journal of Applied Physics, 119 (8). 84507pp. doi:10.1063/1.4942657
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs | ||
Journal | Journal of Applied Physics | ||
Authors | Krylov, Igor | Author | |
Pokroy, Boaz | Author | ||
Ritter, Dan | Author | ||
Eizenberg, Moshe | Author | ||
Year | 2016 (February 28) | Volume | 119 |
Issue | 8 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.4942657Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5204997 | Long-form Identifier | mindat:1:5:5204997:8 |
GUID | 0 | ||
Full Reference | Krylov, Igor, Pokroy, Boaz, Ritter, Dan, Eizenberg, Moshe (2016) A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs. Journal of Applied Physics, 119 (8). 84507pp. doi:10.1063/1.4942657 | ||
Plain Text | Krylov, Igor, Pokroy, Boaz, Ritter, Dan, Eizenberg, Moshe (2016) A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs. Journal of Applied Physics, 119 (8). 84507pp. doi:10.1063/1.4942657 | ||
In | (2016, February) Journal of Applied Physics Vol. 119 (8) AIP Publishing |
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