Talantsev, Artem, Elzwawy, Amir, Kim, CheolGi (2018) Effect of NiFeCr seed and capping layers on exchange bias and planar Hall voltage response of NiFe/Au/IrMn trilayer structures. Journal of Applied Physics, 123 (17). 173902pp. doi:10.1063/1.5023888
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Effect of NiFeCr seed and capping layers on exchange bias and planar Hall voltage response of NiFe/Au/IrMn trilayer structures | ||
Journal | Journal of Applied Physics | ||
Authors | Talantsev, Artem | Author | |
Elzwawy, Amir | Author | ||
Kim, CheolGi | Author | ||
Year | 2018 (May 7) | Volume | 123 |
Issue | 17 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.5023888Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5208963 | Long-form Identifier | mindat:1:5:5208963:9 |
GUID | 0 | ||
Full Reference | Talantsev, Artem, Elzwawy, Amir, Kim, CheolGi (2018) Effect of NiFeCr seed and capping layers on exchange bias and planar Hall voltage response of NiFe/Au/IrMn trilayer structures. Journal of Applied Physics, 123 (17). 173902pp. doi:10.1063/1.5023888 | ||
Plain Text | Talantsev, Artem, Elzwawy, Amir, Kim, CheolGi (2018) Effect of NiFeCr seed and capping layers on exchange bias and planar Hall voltage response of NiFe/Au/IrMn trilayer structures. Journal of Applied Physics, 123 (17). 173902pp. doi:10.1063/1.5023888 | ||
In | (2018, May) Journal of Applied Physics Vol. 123 (17) AIP Publishing |
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