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Daanoune, Mehdi, Clerc, Raphaël, Flament, Bruno, Hirsch, Lionel (2020) Physics of trap assisted photomultiplication in vertical organic photoresistors. Journal of Applied Physics, 127 (5). 55502pp. doi:10.1063/1.5126338

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Reference TypeJournal (article/letter/editorial)
TitlePhysics of trap assisted photomultiplication in vertical organic photoresistors
JournalJournal of Applied Physics
AuthorsDaanoune, MehdiAuthor
Clerc, RaphaëlAuthor
Flament, BrunoAuthor
Hirsch, LionelAuthor
Year2020 (February 7)Volume127
Issue5
PublisherAIP Publishing
DOIdoi:10.1063/1.5126338Search in ResearchGate
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Mindat Ref. ID5213065Long-form Identifiermindat:1:5:5213065:0
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Full ReferenceDaanoune, Mehdi, Clerc, Raphaël, Flament, Bruno, Hirsch, Lionel (2020) Physics of trap assisted photomultiplication in vertical organic photoresistors. Journal of Applied Physics, 127 (5). 55502pp. doi:10.1063/1.5126338
Plain TextDaanoune, Mehdi, Clerc, Raphaël, Flament, Bruno, Hirsch, Lionel (2020) Physics of trap assisted photomultiplication in vertical organic photoresistors. Journal of Applied Physics, 127 (5). 55502pp. doi:10.1063/1.5126338
In(2020, February) Journal of Applied Physics Vol. 127 (5) AIP Publishing

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