Luo, Tao, Hu, Zhaochu, Zhang, Wen, Günther, Detlef, Liu, Yongsheng, Zong, Keqing, Hu, Shenghong (2018) Reassessment of the influence of carrier gases He and Ar on signal intensities in 193 nm excimer LA-ICP-MS analysis. Journal of Analytical Atomic Spectrometry, 33 (10). 1655-1663 doi:10.1039/c8ja00163d
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Reassessment of the influence of carrier gases He and Ar on signal intensities in 193 nm excimer LA-ICP-MS analysis | ||
| Journal | Journal of Analytical Atomic Spectrometry | ||
| Authors | Luo, Tao | Author | |
| Hu, Zhaochu | Author | ||
| Zhang, Wen | Author | ||
| Günther, Detlef | Author | ||
| Liu, Yongsheng | Author | ||
| Zong, Keqing | Author | ||
| Hu, Shenghong | Author | ||
| Year | 2018 | Volume | 33 |
| Issue | 10 | ||
| Publisher | Royal Society of Chemistry (RSC) | ||
| DOI | doi:10.1039/c8ja00163dSearch in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5344538 | Long-form Identifier | mindat:1:5:5344538:2 |
| GUID | 0 | ||
| Full Reference | Luo, Tao, Hu, Zhaochu, Zhang, Wen, Günther, Detlef, Liu, Yongsheng, Zong, Keqing, Hu, Shenghong (2018) Reassessment of the influence of carrier gases He and Ar on signal intensities in 193 nm excimer LA-ICP-MS analysis. Journal of Analytical Atomic Spectrometry, 33 (10). 1655-1663 doi:10.1039/c8ja00163d | ||
| Plain Text | Luo, Tao, Hu, Zhaochu, Zhang, Wen, Günther, Detlef, Liu, Yongsheng, Zong, Keqing, Hu, Shenghong (2018) Reassessment of the influence of carrier gases He and Ar on signal intensities in 193 nm excimer LA-ICP-MS analysis. Journal of Analytical Atomic Spectrometry, 33 (10). 1655-1663 doi:10.1039/c8ja00163d | ||
| In | (2018) Journal of Analytical Atomic Spectrometry Vol. 33 (10) Royal Society of Chemistry (RSC) | ||
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