Petrascu, M., Berceanu, I., Brancus, I., Buta, A., Duma, M., Grama, C., Lazar, I., Mihai, I., Petrovici, M., Simion, V., Mihaila, M., Ghita, I. (1984) A method for analysis and profiling of boron, carbon and oxygen impurities in semiconductor wafers by recoil atoms in heavy ion beams. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 4 (3). 396-398 doi:10.1016/0168-583x(84)90585-8
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | A method for analysis and profiling of boron, carbon and oxygen impurities in semiconductor wafers by recoil atoms in heavy ion beams | ||
| Journal | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | ||
| Authors | Petrascu, M. | Author | |
| Berceanu, I. | Author | ||
| Brancus, I. | Author | ||
| Buta, A. | Author | ||
| Duma, M. | Author | ||
| Grama, C. | Author | ||
| Lazar, I. | Author | ||
| Mihai, I. | Author | ||
| Petrovici, M. | Author | ||
| Simion, V. | Author | ||
| Mihaila, M. | Author | ||
| Ghita, I. | Author | ||
| Year | 1984 (August) | Volume | 4 |
| Issue | 3 | ||
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/0168-583x(84)90585-8Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5582843 | Long-form Identifier | mindat:1:5:5582843:7 |
| GUID | 0 | ||
| Full Reference | Petrascu, M., Berceanu, I., Brancus, I., Buta, A., Duma, M., Grama, C., Lazar, I., Mihai, I., Petrovici, M., Simion, V., Mihaila, M., Ghita, I. (1984) A method for analysis and profiling of boron, carbon and oxygen impurities in semiconductor wafers by recoil atoms in heavy ion beams. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 4 (3). 396-398 doi:10.1016/0168-583x(84)90585-8 | ||
| Plain Text | Petrascu, M., Berceanu, I., Brancus, I., Buta, A., Duma, M., Grama, C., Lazar, I., Mihai, I., Petrovici, M., Simion, V., Mihaila, M., Ghita, I. (1984) A method for analysis and profiling of boron, carbon and oxygen impurities in semiconductor wafers by recoil atoms in heavy ion beams. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 4 (3). 396-398 doi:10.1016/0168-583x(84)90585-8 | ||
| In | (1984, August) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 4 (3) Elsevier BV | ||
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