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Smith, T.C. (1987) Status of IC applications of ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). 90-95 doi:10.1016/0168-583x(87)90804-4

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Reference TypeJournal (article/letter/editorial)
TitleStatus of IC applications of ion implantation
JournalNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
AuthorsSmith, T.C.Author
Year1987 (January)Volume21
Issue1
PublisherElsevier BV
DOIdoi:10.1016/0168-583x(87)90804-4Search in ResearchGate
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Mindat Ref. ID5588032Long-form Identifiermindat:1:5:5588032:1
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Full ReferenceSmith, T.C. (1987) Status of IC applications of ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). 90-95 doi:10.1016/0168-583x(87)90804-4
Plain TextSmith, T.C. (1987) Status of IC applications of ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). 90-95 doi:10.1016/0168-583x(87)90804-4
In(1987, January) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 21 (1) Elsevier BV

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Sakudo, N. (1987) Microwave ion source for ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). 168-177 doi:10.1016/0168-583x(87)90819-6
Gibbons, James F. (1987) Historical perspectives on ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). 83-89 doi:10.1016/0168-583x(87)90803-2
Wauk, M.T. (1987) New ion implantation system with advanced process capabilities. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). 280-284 doi:10.1016/0168-583x(87)90842-1
Seidel, T.E. (1987) CMOS process review with implications for ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). 96-103 doi:10.1016/0168-583x(87)90805-6
Dearnaley, G. (1987) IOn implantation part II: Ion implantation in nonelectronic materials. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 24. 506-511 doi:10.1016/0168-583x(87)90696-3
(1987) Committees. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). doi:10.1016/0168-583x(87)90130-3
(1987) Committees. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). doi:10.1016/0168-583x(87)90802-0
Wei Kan Chu, (1987) Ion implantation science and technology. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 28 (1). 157pp. doi:10.1016/0168-583x(87)90053-x
McGuire, Edward (1987) 0.1% ultra-uniformity in electrostatically scanned ion implantation systems. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). 431-432 doi:10.1016/0168-583x(87)90872-x
(1987) Editorial Board. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 21 (1). doi:10.1016/0168-583x(87)90128-5
Buchal, Ch. (1995) Ion implantation for optical applications. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 96 (1). 370-373 doi:10.1016/0168-583x(95)80011-5
 
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