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Sigmon, T.W., Parker, M.A. (1989) Solid phase epitaxial processes in implant-amorphized semiconductors. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 280-284 doi:10.1016/0168-583x(89)90186-9

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Reference TypeJournal (article/letter/editorial)
TitleSolid phase epitaxial processes in implant-amorphized semiconductors
JournalNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
AuthorsSigmon, T.W.Author
Parker, M.A.Author
Year1989 (February)Volume37
PublisherElsevier BV
DOIdoi:10.1016/0168-583x(89)90186-9Search in ResearchGate
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Mindat Ref. ID5592008Long-form Identifiermindat:1:5:5592008:1
GUID0
Full ReferenceSigmon, T.W., Parker, M.A. (1989) Solid phase epitaxial processes in implant-amorphized semiconductors. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 280-284 doi:10.1016/0168-583x(89)90186-9
Plain TextSigmon, T.W., Parker, M.A. (1989) Solid phase epitaxial processes in implant-amorphized semiconductors. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 280-284 doi:10.1016/0168-583x(89)90186-9
In(1989) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 37. Elsevier BV

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Sigmon, T.W. (1985) Ion implantation in II–VI compound semiconductors. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 7. 402-408 doi:10.1016/0168-583x(85)90588-9
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Conlon, T.W. (1989) Materials characterization with MeV ions. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 40. 828-832 doi:10.1016/0168-583x(89)90487-4
(1989) Author index. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 979-994 doi:10.1016/0168-583x(89)90338-8
Ryssel, Heiner (1989) Ion implantation in semiconductors. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 42 (1). 149pp. doi:10.1016/0168-583x(89)90023-2
(1989) Calendar. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 43 (2). 262-264 doi:10.1016/0168-583x(89)90049-9
Fairbairn, Kevin (1989) Precision implant 9200 — An implantation system for 200 mm wafers. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 596-600 doi:10.1016/0168-583x(89)90255-3
 
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