Reference Type | Journal (article/letter/editorial) |
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Title | Process-induced defects in VLSI |
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Journal | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |
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Authors | Kolbesen, B.O. | Author |
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Bergholz, W. | Author |
Cerva, H. | Author |
Fiegl, B. | Author |
Gelsdorf, F. | Author |
Zoth, G. | Author |
Year | 1991 (April) | Volume | 55 |
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Issue | 1 |
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Publisher | Elsevier BV |
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DOI | doi:10.1016/0168-583x(91)96148-eSearch in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 5596263 | Long-form Identifier | mindat:1:5:5596263:4 |
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GUID | 0 |
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Full Reference | Kolbesen, B.O., Bergholz, W., Cerva, H., Fiegl, B., Gelsdorf, F., Zoth, G. (1991) Process-induced defects in VLSI. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 124-131 doi:10.1016/0168-583x(91)96148-e |
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Plain Text | Kolbesen, B.O., Bergholz, W., Cerva, H., Fiegl, B., Gelsdorf, F., Zoth, G. (1991) Process-induced defects in VLSI. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 124-131 doi:10.1016/0168-583x(91)96148-e |
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In | (1991, April) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 55 (1) Elsevier BV |
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