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Petrov, Yu.V., Anikeva, A.E., Vyvenko, O.F. (2018) Helium ion beam induced electron emission from insulating silicon nitride films under charging conditions. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 425. 11-17 doi:10.1016/j.nimb.2018.04.001

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Reference TypeJournal (article/letter/editorial)
TitleHelium ion beam induced electron emission from insulating silicon nitride films under charging conditions
JournalNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
AuthorsPetrov, Yu.V.Author
Anikeva, A.E.Author
Vyvenko, O.F.Author
Year2018 (June)Volume425
PublisherElsevier BV
DOIdoi:10.1016/j.nimb.2018.04.001Search in ResearchGate
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Mindat Ref. ID5655804Long-form Identifiermindat:1:5:5655804:9
GUID0
Full ReferencePetrov, Yu.V., Anikeva, A.E., Vyvenko, O.F. (2018) Helium ion beam induced electron emission from insulating silicon nitride films under charging conditions. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 425. 11-17 doi:10.1016/j.nimb.2018.04.001
Plain TextPetrov, Yu.V., Anikeva, A.E., Vyvenko, O.F. (2018) Helium ion beam induced electron emission from insulating silicon nitride films under charging conditions. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 425. 11-17 doi:10.1016/j.nimb.2018.04.001
In(2018) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 425. Elsevier BV

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Petrov, Yu.V., Grigoryev, E.A., Sharov, T.V., Baraban, A.P. (2018) Effect of helium ion beam treatment on wet etching of silicon dioxide. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 418. 94-100 doi:10.1016/j.nimb.2018.01.011
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