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Picard, A, Turban, G, Grolleau, B (1986) Plasma diagnostics of a SF6radiofrequency discharge used for the etching of silicon. Journal of Physics D: Applied Physics, 19. 991-1005 doi:10.1088/0022-3727/19/6/014

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Reference TypeJournal (article/letter/editorial)
TitlePlasma diagnostics of a SF6radiofrequency discharge used for the etching of silicon
JournalJournal of Physics D: Applied Physics
AuthorsPicard, AAuthor
Turban, GAuthor
Grolleau, BAuthor
Year1986 (June 14)Volume19
PublisherIOP Publishing
DOIdoi:10.1088/0022-3727/19/6/014Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5662693Long-form Identifiermindat:1:5:5662693:3
GUID0
Full ReferencePicard, A, Turban, G, Grolleau, B (1986) Plasma diagnostics of a SF6radiofrequency discharge used for the etching of silicon. Journal of Physics D: Applied Physics, 19. 991-1005 doi:10.1088/0022-3727/19/6/014
Plain TextPicard, A, Turban, G, Grolleau, B (1986) Plasma diagnostics of a SF6radiofrequency discharge used for the etching of silicon. Journal of Physics D: Applied Physics, 19. 991-1005 doi:10.1088/0022-3727/19/6/014
In(1986) Journal of Physics D: Applied Physics Vol. 19. IOP Publishing

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Xi, D P (1986) Density distribution of an electron plasma column in a Penning discharge. Journal of Physics D: Applied Physics, 19. 2325-2335 doi:10.1088/0022-3727/19/12/012
Fujita, H, Yagura, S, Ueno, H, Nagano, M (1986) Plasma production with DC discharge planar magnetron device for thin film preparation. Journal of Physics D: Applied Physics, 19. 1699-1706 doi:10.1088/0022-3727/19/9/014
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Hinz, K -P (1986) Optical diagnostics of SF6high-current discharges. Journal of Physics D: Applied Physics, 19. 2381-2391 doi:10.1088/0022-3727/19/12/017
Zurro, B, Pardo, C, Rivas, J L Alvarez (1986) A study of the bolometric capabilities of quartz for hot plasmas. Journal of Physics D: Applied Physics, 19. 1895-1901 doi:10.1088/0022-3727/19/10/014
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Pelletier, J, Arnal, Y, Petit, B, Pomot, C, Pichot, M (1986) Microwave multipolar plasmas: a possible solution for etching in microelectronics?. Journal of Physics D: Applied Physics, 19. 795-809 doi:10.1088/0022-3727/19/5/012
McLucas, C W, McIntosh, A I (1986) Discharge heated longitudinal Sr+recombination laser. Journal of Physics D: Applied Physics, 19. 1189-1195 doi:10.1088/0022-3727/19/7/009
Kubovy, A (1986) A percolation model of the conduction threshold in thick-film resistors: segregated structures. Journal of Physics D: Applied Physics, 19. 2171-2183 doi:10.1088/0022-3727/19/11/014
Mustafaev, A S, Mezentsev, A P (1986) Relaxation of a highly concentrated electron beam in a plasma. Journal of Physics D: Applied Physics, 19. doi:10.1088/0022-3727/19/5/001
Tinck, Stefan, Bogaerts, Annemie (2016) Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon. Journal of Physics D: Applied Physics, 49. 245204pp. doi:10.1088/0022-3727/49/24/245204
 
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