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Bichsel, R, Levy, F (1986) Influence of process conditions on the electrical and optical properties of RF magnetron sputtered MoS2films. Journal of Physics D: Applied Physics, 19. 1809-1819 doi:10.1088/0022-3727/19/9/025

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of process conditions on the electrical and optical properties of RF magnetron sputtered MoS2films
JournalJournal of Physics D: Applied Physics
AuthorsBichsel, RAuthor
Levy, FAuthor
Year1986 (September 14)Volume19
PublisherIOP Publishing
DOIdoi:10.1088/0022-3727/19/9/025Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5662783Long-form Identifiermindat:1:5:5662783:5
GUID0
Full ReferenceBichsel, R, Levy, F (1986) Influence of process conditions on the electrical and optical properties of RF magnetron sputtered MoS2films. Journal of Physics D: Applied Physics, 19. 1809-1819 doi:10.1088/0022-3727/19/9/025
Plain TextBichsel, R, Levy, F (1986) Influence of process conditions on the electrical and optical properties of RF magnetron sputtered MoS2films. Journal of Physics D: Applied Physics, 19. 1809-1819 doi:10.1088/0022-3727/19/9/025
In(1986) Journal of Physics D: Applied Physics Vol. 19. IOP Publishing

See Also

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Bichsel, R, Buffat, P, Levy, F (1986) Correlation between process conditions, chemical composition and morphology of MoS2films prepared by RF planar magnetron sputtering. Journal of Physics D: Applied Physics, 19. 1575-1585 doi:10.1088/0022-3727/19/8/025
Qiao, Li, Wang, Peng, Chai, Liqiang, Zhang, Xiaolong, Liu, Weimin (2015) Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2films. Journal of Physics D: Applied Physics, 48. 175304pp. doi:10.1088/0022-3727/48/17/175304
Szymanski, A, Bak, G W (1986) Experimental evidence of crucial influence of injected carriers on electrical properties of some organic molecular solids. Journal of Physics D: Applied Physics, 19. doi:10.1088/0022-3727/19/2/003
Sultan, M, Singh, R (2009) Structural and optical properties of RF-sputtered ZnFe2O4thin films. Journal of Physics D: Applied Physics, 42. 115306pp. doi:10.1088/0022-3727/42/11/115306
Stapinski, T, Leja, E, Pisarkiewicz, T (1984) Point defects and their influence on electrical properties of reactive sputtered Cd2SnO4thin films. Journal of Physics D: Applied Physics, 17. 407-413 doi:10.1088/0022-3727/17/2/025
Sullivan, J L (1986) Boundary lubrication and oxidational wear. Journal of Physics D: Applied Physics, 19. 1999-2011 doi:10.1088/0022-3727/19/10/025
Gribi, P, Sun, Z W, Levy, F (1989) Effects of low-energy ion bombardment on RF sputtered MoS2-xfilms. Journal of Physics D: Applied Physics, 22. 238-240 doi:10.1088/0022-3727/22/1/037
Williams, M M R (1986) Thermophoretic forces acting on a spheroid. Journal of Physics D: Applied Physics, 19. 1631-1642 doi:10.1088/0022-3727/19/9/009
Pignolet, A, Schmid, P E, Wang, L, Levy, F (1991) Structure and electrical properties of sputtered lead titanate thin films. Journal of Physics D: Applied Physics, 24. 619-621 doi:10.1088/0022-3727/24/4/014
Chaman, S, Hoang-The-Giam, , Ai, Bui, Mailfert, R, Jeanjean, R (1986) Pressure and temperature effects on electrical breakdown of sulphur hexafluoride gas. Journal of Physics D: Applied Physics, 19. doi:10.1088/0022-3727/19/6/003
Rogers, A J (1986) Distributed optical-fibre sensors. Journal of Physics D: Applied Physics, 19. 2237-2255 doi:10.1088/0022-3727/19/12/004
 
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