Tabata, A, Fujii, S, Suzuoki, Y, Mizutani, T, Ieda, M (1990) X-ray photoelectron spectroscopy (XPS) of hydrogenated amorphous silicon carbide (a-SixC1-x:H) prepared by the plasma CVD method. Journal of Physics D: Applied Physics, 23. 316-320 doi:10.1088/0022-3727/23/3/008
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | X-ray photoelectron spectroscopy (XPS) of hydrogenated amorphous silicon carbide (a-SixC1-x:H) prepared by the plasma CVD method | ||
Journal | Journal of Physics D: Applied Physics | ||
Authors | Tabata, A | Author | |
Fujii, S | Author | ||
Suzuoki, Y | Author | ||
Mizutani, T | Author | ||
Ieda, M | Author | ||
Year | 1990 (March 14) | Volume | 23 |
Publisher | IOP Publishing | ||
DOI | doi:10.1088/0022-3727/23/3/008Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5663905 | Long-form Identifier | mindat:1:5:5663905:2 |
GUID | 0 | ||
Full Reference | Tabata, A, Fujii, S, Suzuoki, Y, Mizutani, T, Ieda, M (1990) X-ray photoelectron spectroscopy (XPS) of hydrogenated amorphous silicon carbide (a-SixC1-x:H) prepared by the plasma CVD method. Journal of Physics D: Applied Physics, 23. 316-320 doi:10.1088/0022-3727/23/3/008 | ||
Plain Text | Tabata, A, Fujii, S, Suzuoki, Y, Mizutani, T, Ieda, M (1990) X-ray photoelectron spectroscopy (XPS) of hydrogenated amorphous silicon carbide (a-SixC1-x:H) prepared by the plasma CVD method. Journal of Physics D: Applied Physics, 23. 316-320 doi:10.1088/0022-3727/23/3/008 | ||
In | (1989) Journal of Physics D: Applied Physics Vol. 23. IOP Publishing |
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