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Hassan, Zahedul, Fujita, Hiroharu (1998) Dynamic potential formation of a rf sheath near the substrate in a dc discharge plasma. Journal of Physics D: Applied Physics, 31. 2281-2285 doi:10.1088/0022-3727/31/18/013

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Reference TypeJournal (article/letter/editorial)
TitleDynamic potential formation of a rf sheath near the substrate in a dc discharge plasma
JournalJournal of Physics D: Applied Physics
AuthorsHassan, ZahedulAuthor
Fujita, HiroharuAuthor
Year1998 (September 21)Volume31
PublisherIOP Publishing
DOIdoi:10.1088/0022-3727/31/18/013Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5667070Long-form Identifiermindat:1:5:5667070:3
GUID0
Full ReferenceHassan, Zahedul, Fujita, Hiroharu (1998) Dynamic potential formation of a rf sheath near the substrate in a dc discharge plasma. Journal of Physics D: Applied Physics, 31. 2281-2285 doi:10.1088/0022-3727/31/18/013
Plain TextHassan, Zahedul, Fujita, Hiroharu (1998) Dynamic potential formation of a rf sheath near the substrate in a dc discharge plasma. Journal of Physics D: Applied Physics, 31. 2281-2285 doi:10.1088/0022-3727/31/18/013
In(1998) Journal of Physics D: Applied Physics Vol. 31. IOP Publishing

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Nasser, Mahmood, Fujita, Hiroharu (2000) Potential formation near negative charge collecting substrate in negative ion plasma. Journal of Physics D: Applied Physics, 33. 2781-2785 doi:10.1088/0022-3727/33/21/317
Jiting, Ouyang, Changgen, Feng, Hexing, Hui (1998) A model study of the surface discharge induced plasma chemical process. Journal of Physics D: Applied Physics, 31. 1852-1856 doi:10.1088/0022-3727/31/15/013
Beckmann, M, Himmel, G (1998) Nonlinear mode competition between unstable drift waves in an rf heated ring discharge. Journal of Physics D: Applied Physics, 31. 1695-1705 doi:10.1088/0022-3727/31/14/013
Popa, S D, Chiru, P, Ciobotaru, L (1998) Modification of the nitrogen spectrum in a flowing dc discharge. Journal of Physics D: Applied Physics, 31. doi:10.1088/0022-3727/31/15/001
Goto, Naohiko (1998) Plasma density control in a low-pressure RF resonant field. Journal of Physics D: Applied Physics, 31. 428-433 doi:10.1088/0022-3727/31/4/012
Benedictis, S De, Dilecce, G, Simek, M (1998) LIF measurement of population density in a pulsed rf discharge. Journal of Physics D: Applied Physics, 31. 1197-1205 doi:10.1088/0022-3727/31/10/011
Okuno, Yoshihiro, Ohtsu, Yasunori, Fujita, Hiroharu (1992) Modulation of Electron Velocity Distribution Function by Moving Cathode Sheath in a Low-Pressure rf Discharge. Japanese Journal of Applied Physics, 31. 1194-1198 doi:10.1143/jjap.31.1194
Mändl, S, Günzel, R, Möller, W (1998) Sheath and presheath dynamics in plasma immersion ion implantation. Journal of Physics D: Applied Physics, 31. 1109-1117 doi:10.1088/0022-3727/31/9/012
Okuno, Yoshihiro, Yagura, Shinya, Fujita, Hiroharu (1989) Observation of sheath structure near a rf electrode in a magnetized afterglow plasma. Journal of Applied Physics, 65 (6). 2205-2208 doi:10.1063/1.342831
Starikovskaia, S M, Starikovskii, A Yu, Zatsepin, D V (1998) The development of a spatially uniform fast ionization wave in a large discharge volume. Journal of Physics D: Applied Physics, 31. 1118-1125 doi:10.1088/0022-3727/31/9/013
Nemchinsky, Valerian A (1998) Plasma flow in a nozzle during plasma arc cutting. Journal of Physics D: Applied Physics, 31. 3102-3107 doi:10.1088/0022-3727/31/21/016
 
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