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Bourdillon, A J, Boothroyd, C B, Kong, J R, Vladimirsky, Y (2000) A critical condition in Fresnel diffraction used for ultra-high resolution lithographic printing. Journal of Physics D: Applied Physics, 33. 2133-2141 doi:10.1088/0022-3727/33/17/307

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Reference TypeJournal (article/letter/editorial)
TitleA critical condition in Fresnel diffraction used for ultra-high resolution lithographic printing
JournalJournal of Physics D: Applied Physics
AuthorsBourdillon, A JAuthor
Boothroyd, C BAuthor
Kong, J RAuthor
Vladimirsky, YAuthor
Year2000 (September 7)Volume33
PublisherIOP Publishing
DOIdoi:10.1088/0022-3727/33/17/307Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5668071Long-form Identifiermindat:1:5:5668071:9
GUID0
Full ReferenceBourdillon, A J, Boothroyd, C B, Kong, J R, Vladimirsky, Y (2000) A critical condition in Fresnel diffraction used for ultra-high resolution lithographic printing. Journal of Physics D: Applied Physics, 33. 2133-2141 doi:10.1088/0022-3727/33/17/307
Plain TextBourdillon, A J, Boothroyd, C B, Kong, J R, Vladimirsky, Y (2000) A critical condition in Fresnel diffraction used for ultra-high resolution lithographic printing. Journal of Physics D: Applied Physics, 33. 2133-2141 doi:10.1088/0022-3727/33/17/307
In(2000) Journal of Physics D: Applied Physics Vol. 33. IOP Publishing

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Bourdillon, A J, Boothroyd, C B (2001) Proximity correction simulations in ultra-high resolution x-ray lithography. Journal of Physics D: Applied Physics, 34. 3209-3213 doi:10.1088/0022-3727/34/22/301
Bourdillon, Antony J, Boothroyd, Chris B, Williams, Gwyn P, Vladimirsky, Yuli (2003) Near field x-ray lithography simulations for printing fine bridges. Journal of Physics D: Applied Physics, 36. 2471-2482 doi:10.1088/0022-3727/36/20/008
Vladimirsky, Yuli, Bourdillon, Antony, Vladimirsky, Olga, Jiang, Wenlong, Leonard, Quinn (1999) Demagnification in proximity x-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction. Journal of Physics D: Applied Physics, 32. doi:10.1088/0022-3727/32/22/102
Bourdillon, Antony J, Boothroyd, Chris B (2005) Simulations for printing contacts with near field x-rays. Journal of Physics D: Applied Physics, 38. 2947-2951 doi:10.1088/0022-3727/38/16/031
Pavlov, K M, Kewish, C M, Davis, J R, Morgan, M J (2000) A new theoretical approach to x-ray diffraction tomography. Journal of Physics D: Applied Physics, 33. 1596-1605 doi:10.1088/0022-3727/33/13/307
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Nikulin, A Y, Siu, K, Davis, J R, Usher, B F (2000) On a possibility of high-resolution characterization of InGaAs/GaAs multilayers using phase-retrieval x-ray diffractometry technique. Journal of Physics D: Applied Physics, 33. 2521-2526 doi:10.1088/0022-3727/33/20/301
Lyberatos, A, Ferré, J (2000) Domain wall velocity in ultra-thin magnetic films with perpendicular anisotropy. Journal of Physics D: Applied Physics, 33. 1060-1069 doi:10.1088/0022-3727/33/9/305
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Sintov, Y, Shahadi, A (2000) Thermal-instability considerations for pulsed microwave-excited CO2slab lasers. Journal of Physics D: Applied Physics, 33. 2125-2132 doi:10.1088/0022-3727/33/17/306
 
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