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Zhang, Yongping, Gao, Hongjun, Gu, Yousong (2001) Structure studies of C3N4thin films prepared by microwave plasma chemical vapour deposition. Journal of Physics D: Applied Physics, 34. 299-302 doi:10.1088/0022-3727/34/3/308

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Reference TypeJournal (article/letter/editorial)
TitleStructure studies of C3N4thin films prepared by microwave plasma chemical vapour deposition
JournalJournal of Physics D: Applied Physics
AuthorsZhang, YongpingAuthor
Gao, HongjunAuthor
Gu, YousongAuthor
Year2001 (February 7)Volume34
PublisherIOP Publishing
DOIdoi:10.1088/0022-3727/34/3/308Search in ResearchGate
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Mindat Ref. ID5668824Long-form Identifiermindat:1:5:5668824:3
GUID0
Full ReferenceZhang, Yongping, Gao, Hongjun, Gu, Yousong (2001) Structure studies of C3N4thin films prepared by microwave plasma chemical vapour deposition. Journal of Physics D: Applied Physics, 34. 299-302 doi:10.1088/0022-3727/34/3/308
Plain TextZhang, Yongping, Gao, Hongjun, Gu, Yousong (2001) Structure studies of C3N4thin films prepared by microwave plasma chemical vapour deposition. Journal of Physics D: Applied Physics, 34. 299-302 doi:10.1088/0022-3727/34/3/308
In(2000) Journal of Physics D: Applied Physics Vol. 34. IOP Publishing

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