Log InRegister
Quick Links : The Mindat ManualThe Rock H. Currier Digital LibraryMindat Newsletter [Free Download]
Home PageAbout MindatThe Mindat ManualHistory of MindatCopyright StatusWho We AreContact UsAdvertise on Mindat
Donate to MindatCorporate SponsorshipSponsor a PageSponsored PagesMindat AdvertisersAdvertise on Mindat
Learning CenterWhat is a mineral?The most common minerals on earthInformation for EducatorsMindat ArticlesThe ElementsThe Rock H. Currier Digital LibraryGeologic Time
Minerals by PropertiesMinerals by ChemistryAdvanced Locality SearchRandom MineralRandom LocalitySearch by minIDLocalities Near MeSearch ArticlesSearch GlossaryMore Search Options
Search For:
Mineral Name:
Locality Name:
Keyword(s):
 
The Mindat ManualAdd a New PhotoRate PhotosLocality Edit ReportCoordinate Completion ReportAdd Glossary Item
Mining CompaniesStatisticsUsersMineral MuseumsClubs & OrganizationsMineral Shows & EventsThe Mindat DirectoryDevice SettingsThe Mineral Quiz
Photo SearchPhoto GalleriesSearch by ColorNew Photos TodayNew Photos YesterdayMembers' Photo GalleriesPast Photo of the Day GalleryPhotography

Lopaev, D V, Rakhimova, T V, Rakhimov, A T, Zotovich, A I, Zyryanov, S M, Baklanov, M R (2018) Silicon dioxide and low-kmaterial sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV. Journal of Physics D: Applied Physics, 51. 2pp. doi:10.1088/1361-6463/aa9c18

Advanced
   -   Only viewable:
Reference TypeJournal (article/letter/editorial)
TitleSilicon dioxide and low-kmaterial sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV
JournalJournal of Physics D: Applied Physics
AuthorsLopaev, D VAuthor
Rakhimova, T VAuthor
Rakhimov, A TAuthor
Zotovich, A IAuthor
Zyryanov, S MAuthor
Baklanov, M RAuthor
Year2018 (January 17)Volume51
PublisherIOP Publishing
DOIdoi:10.1088/1361-6463/aa9c18Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5691832Long-form Identifiermindat:1:5:5691832:0
GUID0
Full ReferenceLopaev, D V, Rakhimova, T V, Rakhimov, A T, Zotovich, A I, Zyryanov, S M, Baklanov, M R (2018) Silicon dioxide and low-kmaterial sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV. Journal of Physics D: Applied Physics, 51. 2pp. doi:10.1088/1361-6463/aa9c18
Plain TextLopaev, D V, Rakhimova, T V, Rakhimov, A T, Zotovich, A I, Zyryanov, S M, Baklanov, M R (2018) Silicon dioxide and low-kmaterial sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV. Journal of Physics D: Applied Physics, 51. 2pp. doi:10.1088/1361-6463/aa9c18
In(2015) Journal of Physics D: Applied Physics Vol. 51. IOP Publishing

See Also

These are possibly similar items as determined by title/reference text matching only.

Lopaev, D V, Mankelevich, Yu A, Rakhimova, T V, Zotovich, A I, Zyryanov, S M, Baklanov, M R (2017) Damage and etching of ultra low-kmaterials in fluorocarbon plasma at lowered temperatures. Journal of Physics D: Applied Physics, 50. 485202pp. doi:10.1088/1361-6463/aa92a7
Volynets, A V, Lopaev, D V, Rakhimova, T V, Chukalovsky, A A, Mankelevich, Yu A, Popov, N A, Zotovich, A I, Rakhimov, A T (2018) N2 dissociation and kinetics of N(4S) atoms in nitrogen DC glow discharge. Journal of Physics D: Applied Physics, 51. 364002pp. doi:10.1088/1361-6463/aad1ca
Zotovich, A I, Lopaev, D V, Bogdanova, M A, Zyryanov, S M, Rakhimov, A T (2022) Experimental study of transition from electron beam to rf-power-controlled plasma in DFCCP in argon with additional ionization by an electron beam. Journal of Physics D: Applied Physics, 55 (31) 315201 doi:10.1088/1361-6463/ac6712
Lopaev, D V, Volynets, A V, Zyryanov, S M, Zotovich, A I, Rakhimov, A T (2017) Actinometry of O, N and F atoms. Journal of Physics D: Applied Physics, 50. 75202pp. doi:10.1088/1361-6463/50/7/075202
Shibanov, D. R., Lopaev, D. V., Zyryanov, S. M., Zotovich, A. I., Maslakov, K. I., Rakhimov, A. T. (2023) Sputtering of amorphous Si by low-energy Ar+, Kr+, and Xe+ ions. Journal of Applied Physics, 134 (6) doi:10.1063/5.0160531
Lopaev, D V, Zyryanov, S M, Zotovich, A I, Rakhimova, T V, Mankelevich, Yu A, Voronina, E N (2020) Damage to porous SiCOH low-k dielectrics by O, N and F atoms at lowered temperatures. Journal of Physics D: Applied Physics, 53. 175203pp. doi:10.1088/1361-6463/ab6e99
Pal, A F, Ryabinkin, A N, Serov, A O, Lopaev, D V, Mankelevich, Yu A, Rakhimov, A T, Rakhimova, T V, Baklanov, M R (2020) VUV radiation flux from argon DC magnetron plasma. Journal of Physics D: Applied Physics, 53 (29) 295202pp. doi:10.1088/1361-6463/ab813f
Lopaev, D V, Zotovich, A I, Zyryanov, S M, Bogdanova, M A, Rakhimova, T V, Mankelevich, Y A, Novikova, N N, Seregin, D S, Vishnevskiy, A S, Vorotilov, K A, Shi, Xiaoping, Baklanov, M R (2022) Effect of H atoms and UV wideband radiation on cured low-k OSG films. Journal of Physics D: Applied Physics, 55 (25) 255206pp. doi:10.1088/1361-6463/ac5eee
Rakhimova, T V, Lopaev, D V, Mankelevich, Yu A, Rakhimov, A T, Zyryanov, S M, Kurchikov, K A, Novikova, N N, Baklanov, M R (2015) Interaction of F atoms with SiOCH ultra-low-kfilms: I. Fluorination and damage. Journal of Physics D: Applied Physics, 48. 175203pp. doi:10.1088/0022-3727/48/17/175203
Braginsky, O. V., Kovalev, A. S., Lopaev, D. V., Malykhin, E. M., Mankelevich, Yu. A., Rakhimova, T. V., Rakhimov, A. T., Vasilieva, A. N., Zyryanov, S. M., Baklanov, M. R. (2010) The mechanism of low-k SiOCH film modification by oxygen atoms. Journal of Applied Physics, 108 (7). 73303pp. doi:10.1063/1.3486084
Rakhimova, T V, Rakhimov, A T, Mankelevich, Yu A, Lopaev, D V, Kovalev, A S, Vasil'eva, A N, Zyryanov, S M, Kurchikov, K, Proshina, O V, Voloshin, D G, Novikova, N N, Krishtab, M B, Baklanov, M R (2014) Low-kfilms modification under EUV and VUV radiation. Journal of Physics D: Applied Physics, 47. 25102pp. doi:10.1088/0022-3727/47/2/025102
 
and/or  
Mindat.org is an outreach project of the Hudson Institute of Mineralogy, a 501(c)(3) not-for-profit organization.
Copyright © mindat.org and the Hudson Institute of Mineralogy 1993-2025, except where stated. Most political location boundaries are Β© OpenStreetMap contributors. Mindat.org relies on the contributions of thousands of members and supporters. Founded in 2000 by Jolyon Ralph.
To cite: Ralph, J., Von Bargen, D., Martynov, P., Zhang, J., Que, X., Prabhu, A., Morrison, S. M., Li, W., Chen, W., & Ma, X. (2025). Mindat.org: The open access mineralogy database to accelerate data-intensive geoscience research. American Mineralogist, 110(6), 833–844. doi:10.2138/am-2024-9486.
Privacy Policy - Terms & Conditions - Contact Us / DMCA issues - Report a bug/vulnerability Current server date and time: August 31, 2025 05:59:54
Go to top of page