| Reference Type | Journal (article/letter/editorial) |
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| Title | Spin accumulation in topological insulator thin films—influence of bulk and topological surface states |
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| Journal | Journal of Physics D: Applied Physics |
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| Authors | Siu, Zhuo Bin | Author |
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| Wang, Yi | Author |
| Yang, Hyunsoo | Author |
| Jalil, Mansoor B A | Author |
| Year | 2018 (October 24) | Volume | 51 |
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| Publisher | IOP Publishing |
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| DOI | doi:10.1088/1361-6463/aadad7Search in ResearchGate |
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| Generate Citation Formats |
| Mindat Ref. ID | 5692912 | Long-form Identifier | mindat:1:5:5692912:2 |
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|
| GUID | 0 |
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| Full Reference | Siu, Zhuo Bin, Wang, Yi, Yang, Hyunsoo, Jalil, Mansoor B A (2018) Spin accumulation in topological insulator thin films—influence of bulk and topological surface states. Journal of Physics D: Applied Physics, 51. 425301pp. doi:10.1088/1361-6463/aadad7 |
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| Plain Text | Siu, Zhuo Bin, Wang, Yi, Yang, Hyunsoo, Jalil, Mansoor B A (2018) Spin accumulation in topological insulator thin films—influence of bulk and topological surface states. Journal of Physics D: Applied Physics, 51. 425301pp. doi:10.1088/1361-6463/aadad7 |
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| In | (2015) Journal of Physics D: Applied Physics Vol. 51. IOP Publishing |
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