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Hong-Ling, Gao, Yi-Ping, Zeng, Bao-Qiang, Wang, Zhan-Ping, Zhu, Zhan-Guo, Wang (2008) Influence of V/III ratio on the structural and photoluminescence properties of In 0.52 AlAs/In 0.53 GaAs metamorphic high electron mobility transistor grown by molecular beam epitaxy. Chinese Physics B, 17. 1119-1123 doi:10.1088/1674-1056/17/3/061

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of V/III ratio on the structural and photoluminescence properties of In 0.52 AlAs/In 0.53 GaAs metamorphic high electron mobility transistor grown by molecular beam epitaxy
JournalChinese Physics B
AuthorsHong-Ling, GaoAuthor
Yi-Ping, ZengAuthor
Bao-Qiang, WangAuthor
Zhan-Ping, ZhuAuthor
Zhan-Guo, WangAuthor
Year2008 (March)Volume17
PublisherIOP Publishing
DOIdoi:10.1088/1674-1056/17/3/061Search in ResearchGate
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Mindat Ref. ID5998300Long-form Identifiermindat:1:5:5998300:6
GUID0
Full ReferenceHong-Ling, Gao, Yi-Ping, Zeng, Bao-Qiang, Wang, Zhan-Ping, Zhu, Zhan-Guo, Wang (2008) Influence of V/III ratio on the structural and photoluminescence properties of In 0.52 AlAs/In 0.53 GaAs metamorphic high electron mobility transistor grown by molecular beam epitaxy. Chinese Physics B, 17. 1119-1123 doi:10.1088/1674-1056/17/3/061
Plain TextHong-Ling, Gao, Yi-Ping, Zeng, Bao-Qiang, Wang, Zhan-Ping, Zhu, Zhan-Guo, Wang (2008) Influence of V/III ratio on the structural and photoluminescence properties of In 0.52 AlAs/In 0.53 GaAs metamorphic high electron mobility transistor grown by molecular beam epitaxy. Chinese Physics B, 17. 1119-1123 doi:10.1088/1674-1056/17/3/061
In(n.d.) Chinese Physics B Vol. 17. IOP Publishing


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