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Zhao, Hua-Bo, Ying, Alex Yi-Qun, Yan, Feng, Wei, Qin-Qin, Fu, Yun-Yi, Zhang, Yan, Li, Yan, Wei, Zi-Jun, Zhang, Zhao-Hui (2011) Enhanced etching of silicon didioxide guided by carbon nanotubes in HF solution. Chinese Physics B, 20. 108103pp. doi:10.1088/1674-1056/20/10/108103

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Reference TypeJournal (article/letter/editorial)
TitleEnhanced etching of silicon didioxide guided by carbon nanotubes in HF solution
JournalChinese Physics B
AuthorsZhao, Hua-BoAuthor
Ying, Alex Yi-QunAuthor
Yan, FengAuthor
Wei, Qin-QinAuthor
Fu, Yun-YiAuthor
Zhang, YanAuthor
Li, YanAuthor
Wei, Zi-JunAuthor
Zhang, Zhao-HuiAuthor
Year2011 (October)Volume20
PublisherIOP Publishing
DOIdoi:10.1088/1674-1056/20/10/108103Search in ResearchGate
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Mindat Ref. ID6000921Long-form Identifiermindat:1:5:6000921:2
GUID0
Full ReferenceZhao, Hua-Bo, Ying, Alex Yi-Qun, Yan, Feng, Wei, Qin-Qin, Fu, Yun-Yi, Zhang, Yan, Li, Yan, Wei, Zi-Jun, Zhang, Zhao-Hui (2011) Enhanced etching of silicon didioxide guided by carbon nanotubes in HF solution. Chinese Physics B, 20. 108103pp. doi:10.1088/1674-1056/20/10/108103
Plain TextZhao, Hua-Bo, Ying, Alex Yi-Qun, Yan, Feng, Wei, Qin-Qin, Fu, Yun-Yi, Zhang, Yan, Li, Yan, Wei, Zi-Jun, Zhang, Zhao-Hui (2011) Enhanced etching of silicon didioxide guided by carbon nanotubes in HF solution. Chinese Physics B, 20. 108103pp. doi:10.1088/1674-1056/20/10/108103
In(n.d.) Chinese Physics B Vol. 20. IOP Publishing

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