| Reference Type | Journal (article/letter/editorial) |
|---|
| Title | Modeling for V—O
2
reactive sputtering process using a pulsed power supply |
|---|
| Journal | Chinese Physics B |
|---|
| Authors | Wang, Tao | Author |
|---|
| Yu, He | Author |
| Dong, Xiang | Author |
| Jiang, Ya-Dong | Author |
| Chen, Chao | Author |
| Wu, Ro-Land | Author |
| Year | 2014 (August) | Volume | 23 |
|---|
| Publisher | IOP Publishing |
|---|
| DOI | doi:10.1088/1674-1056/23/8/088113Search in ResearchGate |
|---|
| Generate Citation Formats |
|---|
| Mindat Ref. ID | 6005338 | Long-form Identifier | mindat:1:5:6005338:3 |
|---|
|
| GUID | 0 |
|---|
| Full Reference | Wang, Tao, Yu, He, Dong, Xiang, Jiang, Ya-Dong, Chen, Chao, Wu, Ro-Land (2014) Modeling for V—O
2
reactive sputtering process using a pulsed power supply. Chinese Physics B, 23. 88113pp. doi:10.1088/1674-1056/23/8/088113 |
|---|
| Plain Text | Wang, Tao, Yu, He, Dong, Xiang, Jiang, Ya-Dong, Chen, Chao, Wu, Ro-Land (2014) Modeling for V—O
2
reactive sputtering process using a pulsed power supply. Chinese Physics B, 23. 88113pp. doi:10.1088/1674-1056/23/8/088113 |
|---|
| In | (n.d.) Chinese Physics B Vol. 23. IOP Publishing |
|---|
These are possibly similar items as determined by title/reference text matching only.
