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Böhme, R., Zimmer, K., Rauschenbach, B. (2006) Laser backside etching of fused silica due to carbon layer ablation. Applied Physics A, 82. 325-328 doi:10.1007/s00339-005-3387-x

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Reference TypeJournal (article/letter/editorial)
TitleLaser backside etching of fused silica due to carbon layer ablation
JournalApplied Physics A
AuthorsBöhme, R.Author
Zimmer, K.Author
Rauschenbach, B.Author
Year2006 (February)Volume82
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s00339-005-3387-xSearch in ResearchGate
Generate Citation Formats
Mindat Ref. ID6012242Long-form Identifiermindat:1:5:6012242:5
GUID0
Full ReferenceBöhme, R., Zimmer, K., Rauschenbach, B. (2006) Laser backside etching of fused silica due to carbon layer ablation. Applied Physics A, 82. 325-328 doi:10.1007/s00339-005-3387-x
Plain TextBöhme, R., Zimmer, K., Rauschenbach, B. (2006) Laser backside etching of fused silica due to carbon layer ablation. Applied Physics A, 82. 325-328 doi:10.1007/s00339-005-3387-x
In(2006) Applied Physics A Vol. 82. Springer Science and Business Media LLC

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Zimmer, K., Böhme, R., Ruthe, D., Rauschenbach, B. (2006) Backside laser etching of fused silica using liquid gallium. Applied Physics A, 84. 455-458 doi:10.1007/s00339-006-3630-0
Zimmer, K., Böhme, R., Rauschenbach, B. (2007) Using IR laser radiation for backside etching of fused silica. Applied Physics A, 86. 409-414 doi:10.1007/s00339-006-3794-7
Zimmer, K., Böhme, R., Rauschenbach, B. (2004) Laser etching of fused silica using an adsorbed toluene layer. Applied Physics A, 79. 1883-1885 doi:10.1007/s00339-004-2961-y
Zimmer, K., Böhme, R., Pissadakis, S., Hartwig, L., Reisse, G., Rauschenbach, B. (2006) Backside etching of fused silica with Nd:YAG laser. Applied Surface Science, 253. 2796-2800 doi:10.1016/j.apsusc.2006.05.059
Böhme, R., Zimmer, K. (2006) Effects of halogenated organic solvents on laser-induced backside wet etching of fused silica. Applied Physics A, 83. 9-12 doi:10.1007/s00339-006-3483-6
Böhme, R., Pissadakis, S., Ruthe, D., Zimmer, K. (2006) Laser backside etching of fused silica with ultra-short pulses. Applied Physics A, 85. 75-78 doi:10.1007/s00339-006-3652-7
Zimmer, K, Böhme, R, Hirsch, D, Rauschenbach, B (2006) Backside etching of fused silica with UV laser pulses using mercury. Journal of Physics D: Applied Physics, 39. 4651-4655 doi:10.1088/0022-3727/39/21/022
Böhme, R., Zajadacz, J., Zimmer, K., Rauschenbach, B. (2005) Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching. Applied Physics A, 80. 433-438 doi:10.1007/s00339-004-3015-1
Zimmer, K., Böhme, R., Ehrhardt, M., Rauschenbach, B. (2010) Mechanism of backside etching of transparent materials with nanosecond UV-lasers. Applied Physics A, 101. 405-410 doi:10.1007/s00339-010-5878-7
Zimmer, K., Böhme, R., Ruthe, D., Rauschenbach, B. (2007) The influence of laser-induced surface modifications on the backside etching process. Applied Surface Science, 253. 6588-6594 doi:10.1016/j.apsusc.2007.01.041
Böhme, R., Hirsch, D., Zimmer, K. (2006) Laser etching of transparent materials at a backside surface adsorbed layer. Applied Surface Science, 252. 4763-4767 doi:10.1016/j.apsusc.2005.06.058
 
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