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Nishikawa, Masami, Nakajima, Tomohiko, Kumagai, Toshiya, Okutani, Takeshi, Tsuchiya, Tetsuo (2010) Photoassisted chemical solution deposition method for fabricating uniformly epitaxial VO2 films. Applied Physics A, 100. 297-303 doi:10.1007/s00339-010-5799-5

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Reference TypeJournal (article/letter/editorial)
TitlePhotoassisted chemical solution deposition method for fabricating uniformly epitaxial VO2 films
JournalApplied Physics A
AuthorsNishikawa, MasamiAuthor
Nakajima, TomohikoAuthor
Kumagai, ToshiyaAuthor
Okutani, TakeshiAuthor
Tsuchiya, TetsuoAuthor
Year2010 (July)Volume100
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s00339-010-5799-5Search in ResearchGate
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Mindat Ref. ID6014553Long-form Identifiermindat:1:5:6014553:2
GUID0
Full ReferenceNishikawa, Masami, Nakajima, Tomohiko, Kumagai, Toshiya, Okutani, Takeshi, Tsuchiya, Tetsuo (2010) Photoassisted chemical solution deposition method for fabricating uniformly epitaxial VO2 films. Applied Physics A, 100. 297-303 doi:10.1007/s00339-010-5799-5
Plain TextNishikawa, Masami, Nakajima, Tomohiko, Kumagai, Toshiya, Okutani, Takeshi, Tsuchiya, Tetsuo (2010) Photoassisted chemical solution deposition method for fabricating uniformly epitaxial VO2 films. Applied Physics A, 100. 297-303 doi:10.1007/s00339-010-5799-5
In(2010) Applied Physics A Vol. 100. Springer Science and Business Media LLC

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Nishikawa, Masami, Nakajima, Tomohiko, Kumagai, Toshiya, Okutani, Takeshi, Tsuchiya, Tetsuo (2011) Non-hysteretic metal–insulator transition of VO2 films grown by excimer-laser-assisted metal organic deposition process. Applied Surface Science, 257. 2643-2646 doi:10.1016/j.apsusc.2010.10.036
NISHIKAWA, Masami, NAKAJIMA, Tomohiko, KUMAGAI, Toshiya, OKUTANI, Takeshi, TSUCHIYA, Tetsuo (2011) Adjustment of thermal hysteresis in epitaxial VO2 films by doping metal ions. Journal of the Ceramic Society of Japan, 119 (1391) 577-580 doi:10.2109/jcersj2.119.577
Nishikawa, Masami, Nakajima, Tomohiko, Kumagai, Toshiya, Okutani, Takeshi, Tsuchiya, Tetsuo (2011) Ti-Doped VO2Films Grown on Glass Substrates by Excimer-Laser-Assisted Metal Organic Deposition Process. Japanese Journal of Applied Physics, 50. 1 doi:10.1143/jjap.50.01be04
Nishikawa, Masami, Nakajima, Tomohiko, Kumagai, Toshiya, Okutani, Takeshi, Tsuchiya, Tetsuo (2011) Ti-Doped VO2Films Grown on Glass Substrates by Excimer-Laser-Assisted Metal Organic Deposition Process. Japanese Journal of Applied Physics, 50 (1) 1 doi:10.7567/jjap.50.01be04
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Nishikawa, Masami, Nakajima, Tomohiko, Manabe, Takaaki, Okutani, Takeshi, Tsuchiya, Tetsuo (2010) High temperature coefficients of resistance of VO2 films grown by excimer-laser-assisted metal organic deposition process for bolometer application. Materials Letters, 64. 1921-1924 doi:10.1016/j.matlet.2010.05.050
NISHIKAWA, Masami, NAKAJIMA, Tomohiko, MANABE, Takaaki, OKUTANI, Takeshi, TSUCHIYA, Tetsuo (2010) Preparation of polycrystalline VO2 films on glass and TiO2/glass substrates by means of excimer laser assisted metal organic deposition. Journal of the Ceramic Society of Japan, 118 (1381) 788-791 doi:10.2109/jcersj2.118.788
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