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Blum, Norman A., Feldman, Charles (1972) The crystallization of amorphous silicon films. Journal of Non-Crystalline Solids, 11 (3) 242-246 doi:10.1016/0022-3093(72)90006-3

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Reference TypeJournal (article/letter/editorial)
TitleThe crystallization of amorphous silicon films
JournalJournal of Non-Crystalline Solids
AuthorsBlum, Norman A.Author
Feldman, CharlesAuthor
Year1972 (November)Volume11
Issue3
PublisherElsevier BV
DOIdoi:10.1016/0022-3093(72)90006-3Search in ResearchGate
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Mindat Ref. ID609277Long-form Identifiermindat:1:5:609277:5
GUID0
Full ReferenceBlum, Norman A., Feldman, Charles (1972) The crystallization of amorphous silicon films. Journal of Non-Crystalline Solids, 11 (3) 242-246 doi:10.1016/0022-3093(72)90006-3
Plain TextBlum, Norman A., Feldman, Charles (1972) The crystallization of amorphous silicon films. Journal of Non-Crystalline Solids, 11 (3) 242-246 doi:10.1016/0022-3093(72)90006-3
In(1972, November) Journal of Non-Crystalline Solids Vol. 11 (3) Elsevier BV

See Also

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Blum, Norman A., Feldman, Charles (1976) The crystallization of amorphous germanium films. Journal of Non-Crystalline Solids, 22 (1) 29-35 doi:10.1016/0022-3093(76)90004-1
Herd, S.R., Chaudhari, P., Brodsky, M.H. (1972) Metal contact induced crystallization in films of amorphous silicon and germanium. Journal of Non-Crystalline Solids, 7 (4) 309-327 doi:10.1016/0022-3093(72)90267-0
Grigorovici, R., Dévényi, A., Gheorghiu, A., Belu, A. (1972) Properties of amorphous carbon films. Journal of Non-Crystalline Solids, 8. 793-797 doi:10.1016/0022-3093(72)90229-3
Brodsky, M.H, Gambino, R.J (1972) Electrical conduction in evaporated amorphous silicon films. Journal of Non-Crystalline Solids, 8. 739-744 doi:10.1016/0022-3093(72)90221-9
Köster, Uwe, Weiss, Petra (1975) Crystallization and decomposition of amorphous silicon-aluminium films. Journal of Non-Crystalline Solids, 17 (3) 359-368 doi:10.1016/0022-3093(75)90126-x
Le Comber, P.G., Madan, A., Spear, W.E. (1972) Electronic transport and state distribution in amorphous Si films. Journal of Non-Crystalline Solids, 11 (3) 219-234 doi:10.1016/0022-3093(72)90004-x
(1972) News items. Journal of Non-Crystalline Solids, 11 (3) 259 doi:10.1016/0022-3093(72)90011-7
Henderson, Douglas, Herman, Frank (1972) Simulation of the atomic arrangements in amorphous silicon and germanium. Journal of Non-Crystalline Solids, 8. 359-363 doi:10.1016/0022-3093(72)90160-3
Moorjani, Kishin, Feldman, Charles (1970) Electrical conduction in amorphous boron and silicon. Journal of Non-Crystalline Solids, 4. 248-255 doi:10.1016/0022-3093(70)90048-7
Ralph, J.E., Woodcock, J.M. (1972) A new filamentary model for voltage formed amorphous oxide films. Journal of Non-Crystalline Solids, 7 (3) 236-250 doi:10.1016/0022-3093(72)90025-7
Vendura, G.J., Henisch, H.K. (1972) Behavior of amorphous semiconductor films between asymmetric electrodes. Journal of Non-Crystalline Solids, 11 (2) 105-112 doi:10.1016/0022-3093(72)90292-x
 
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