Maekawa, S., Ohishi, T. (1994) Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation. Journal of Non-Crystalline Solids, 169 (1) 207-209 doi:10.1016/0022-3093(94)90241-0
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation | ||
Journal | Journal of Non-Crystalline Solids | ||
Authors | Maekawa, S. | Author | |
Ohishi, T. | Author | ||
Year | 1994 (March) | Volume | 169 |
Issue | 1 | ||
Publisher | Elsevier BV | ||
DOI | doi:10.1016/0022-3093(94)90241-0Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 633730 | Long-form Identifier | mindat:1:5:633730:2 |
GUID | 0 | ||
Full Reference | Maekawa, S., Ohishi, T. (1994) Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation. Journal of Non-Crystalline Solids, 169 (1) 207-209 doi:10.1016/0022-3093(94)90241-0 | ||
Plain Text | Maekawa, S., Ohishi, T. (1994) Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation. Journal of Non-Crystalline Solids, 169 (1) 207-209 doi:10.1016/0022-3093(94)90241-0 | ||
In | (1994, March) Journal of Non-Crystalline Solids Vol. 169 (1) Elsevier BV |
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