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Miyake, Yasuhiro, Nishikawa, Hiroyuki, Watanabe, Eiki, Ito, Daisuke (1997) Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser. Journal of Non-Crystalline Solids, 222. 266-271 doi:10.1016/s0022-3093(97)90123-x

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Reference TypeJournal (article/letter/editorial)
TitleChanges in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser
JournalJournal of Non-Crystalline Solids
AuthorsMiyake, YasuhiroAuthor
Nishikawa, HiroyukiAuthor
Watanabe, EikiAuthor
Ito, DaisukeAuthor
Year1997 (December)Volume222
PublisherElsevier BV
DOIdoi:10.1016/s0022-3093(97)90123-xSearch in ResearchGate
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Mindat Ref. ID636743Long-form Identifiermindat:1:5:636743:9
GUID0
Full ReferenceMiyake, Yasuhiro, Nishikawa, Hiroyuki, Watanabe, Eiki, Ito, Daisuke (1997) Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser. Journal of Non-Crystalline Solids, 222. 266-271 doi:10.1016/s0022-3093(97)90123-x
Plain TextMiyake, Yasuhiro, Nishikawa, Hiroyuki, Watanabe, Eiki, Ito, Daisuke (1997) Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser. Journal of Non-Crystalline Solids, 222. 266-271 doi:10.1016/s0022-3093(97)90123-x
In(1997) Journal of Non-Crystalline Solids Vol. 222. Elsevier BV


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