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Matsuki, Nobuyuki, Kondo, Michio, Matsuda, Akihisa (2004) Novel network control in hydrogenated amorphous silicon by molecular beam deposition method. Journal of Non-Crystalline Solids, 338. 382-385 doi:10.1016/j.jnoncrysol.2004.03.002

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Reference TypeJournal (article/letter/editorial)
TitleNovel network control in hydrogenated amorphous silicon by molecular beam deposition method
JournalJournal of Non-Crystalline Solids
AuthorsMatsuki, NobuyukiAuthor
Kondo, MichioAuthor
Matsuda, AkihisaAuthor
Year2004 (June)Volume338
PublisherElsevier BV
DOIdoi:10.1016/j.jnoncrysol.2004.03.002Search in ResearchGate
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Mindat Ref. ID642160Long-form Identifiermindat:1:5:642160:5
GUID0
Full ReferenceMatsuki, Nobuyuki, Kondo, Michio, Matsuda, Akihisa (2004) Novel network control in hydrogenated amorphous silicon by molecular beam deposition method. Journal of Non-Crystalline Solids, 338. 382-385 doi:10.1016/j.jnoncrysol.2004.03.002
Plain TextMatsuki, Nobuyuki, Kondo, Michio, Matsuda, Akihisa (2004) Novel network control in hydrogenated amorphous silicon by molecular beam deposition method. Journal of Non-Crystalline Solids, 338. 382-385 doi:10.1016/j.jnoncrysol.2004.03.002
In(2004) Journal of Non-Crystalline Solids Vol. 338. Elsevier BV

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Shimizu, Satoshi, Miyahara, Hiroomi, Kondo, Michio, Matsuda, Akihisa (2004) Fabrication of hydrogenated amorphous silicon films exibiting higher stability against light soaking. Journal of Non-Crystalline Solids, 338. 47-50 doi:10.1016/j.jnoncrysol.2004.02.019
Fujiwara, Hiroyuki, Kondo, Michio, Matsuda, Akihisa (2004) Nucleation mechanism of microcrystalline silicon from the amorphous phase. Journal of Non-Crystalline Solids, 338. 97-101 doi:10.1016/j.jnoncrysol.2004.02.029
Matsuki, Nobuyuki, Shimizu, Satoshi, Kondo, Michio, Matsuda, Akihisa (2006) Unusual hydrogen distribution and its change in hydrogenated amorphous silicon prepared using bias electric-field molecular beam deposition. Applied Physics Letters, 89 (1). 11909pp. doi:10.1063/1.2219119
Stradins, P., Kondo, Michio, Matsuda, Akihisa (2008) Thermal stability of light-induced defects in hydrogenated amorphous silicon: Effect on defect creation kinetics and role of network microstructure. Journal of Non-Crystalline Solids, 354 (19) 2144-2148 doi:10.1016/j.jnoncrysol.2007.09.011
Matsuda, Akihisa (2004) Microcrystalline silicon. Journal of Non-Crystalline Solids, 338. 1-12 doi:10.1016/j.jnoncrysol.2004.02.012
Niikura, Chisato, Kondo, Michio, Matsuda, Akihisa (2004) Preparation of microcrystalline silicon films at ultra high-rate of 10 nm/s using high-density plasma. Journal of Non-Crystalline Solids, 338. 42-46 doi:10.1016/j.jnoncrysol.2004.02.018
Matsui, Takuya, Kondo, Michio, Matsuda, Akihisa (2004) Doping properties of boron-doped microcrystalline silicon from B2H6 and BF3: material properties and solar cell performance. Journal of Non-Crystalline Solids, 338. 646-650 doi:10.1016/j.jnoncrysol.2004.03.073
Ito, M., Shimizu, S., Kondo, M., Matsuda, A. (2004) Light-soaking stability of silicon thin film solar cells using alternately hydrogenated dilution method. Journal of Non-Crystalline Solids, 338. 698-701 doi:10.1016/j.jnoncrysol.2004.03.061
Nonomura, Shuichi, Yoshida, Norimitsu, Gotoh, Tamihiro, Sakamoto, Tomonari, Kondo, Michio, Matsuda, Akihisa, Nitta, Shoji (2000) The light-induced metastable lattice expansion in hydrogenated amorphous silicon. Journal of Non-Crystalline Solids, 266. 474-480 doi:10.1016/s0022-3093(99)00778-4
Tabata, A., Kuroda, M., Mori, M., Mizutani, T., Suzuoki, Y. (2004) Band gap control of hydrogenated amorphous silicon carbide films prepared by hot-wire chemical vapor deposition. Journal of Non-Crystalline Solids, 338. 521-524 doi:10.1016/j.jnoncrysol.2004.03.033
Tucci, M., Caputo, D. (2004) Study of capacitance in hydrogenated amorphous silicon phototransistors for imaging arrays. Journal of Non-Crystalline Solids, 338. 780-783 doi:10.1016/j.jnoncrysol.2004.03.090
 
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