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Datta, Shouvik, Cohen, J. David, Xu, Yueqin, Mahan, A.H., Branz, Howard M. (2008) Junction capacitance study of an oxygen impurity defect exhibiting configuration relaxation in amorphous silicon–germanium alloys deposited by hot-wire CVD. Journal of Non-Crystalline Solids, 354 (19) 2126-2130 doi:10.1016/j.jnoncrysol.2007.10.036

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Reference TypeJournal (article/letter/editorial)
TitleJunction capacitance study of an oxygen impurity defect exhibiting configuration relaxation in amorphous silicon–germanium alloys deposited by hot-wire CVD
JournalJournal of Non-Crystalline Solids
AuthorsDatta, ShouvikAuthor
Cohen, J. DavidAuthor
Xu, YueqinAuthor
Mahan, A.H.Author
Branz, Howard M.Author
Year2008 (May)Volume354
Issue19
PublisherElsevier BV
DOIdoi:10.1016/j.jnoncrysol.2007.10.036Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID645835Long-form Identifiermindat:1:5:645835:9
GUID0
Full ReferenceDatta, Shouvik, Cohen, J. David, Xu, Yueqin, Mahan, A.H., Branz, Howard M. (2008) Junction capacitance study of an oxygen impurity defect exhibiting configuration relaxation in amorphous silicon–germanium alloys deposited by hot-wire CVD. Journal of Non-Crystalline Solids, 354 (19) 2126-2130 doi:10.1016/j.jnoncrysol.2007.10.036
Plain TextDatta, Shouvik, Cohen, J. David, Xu, Yueqin, Mahan, A.H., Branz, Howard M. (2008) Junction capacitance study of an oxygen impurity defect exhibiting configuration relaxation in amorphous silicon–germanium alloys deposited by hot-wire CVD. Journal of Non-Crystalline Solids, 354 (19) 2126-2130 doi:10.1016/j.jnoncrysol.2007.10.036
In(2008, May) Journal of Non-Crystalline Solids Vol. 354 (19) Elsevier BV

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Datta, Shouvik, Xu, Yueqin, Mahan, A.H., Branz, Howard M., Cohen, J. David (2006) Superior structural and electronic properties for amorphous silicon–germanium alloys deposited by a low temperature hot wire chemical vapor deposition process. Journal of Non-Crystalline Solids, 352 (9) 1250-1254 doi:10.1016/j.jnoncrysol.2005.10.057
Erslev, Peter T., Chiang, Hai Q., Hong, David, Wager, John F., Cohen, J. David (2008) Electronic properties of amorphous zinc tin oxide films by junction capacitance methods. Journal of Non-Crystalline Solids, 354 (19) 2801-2804 doi:10.1016/j.jnoncrysol.2007.09.062
Young, David L., Stradins, Paul, Xu, Yueqin, Gedvilas, Lynn, Reedy, Bob, Mahan, A. H., Branz, Howard M., Wang, Qi, Williamson, D. L. (2006) Rapid solid-phase crystallization of high-rate, hot-wire chemical-vapor-deposited hydrogenated amorphous silicon. Applied Physics Letters, 89 (16). 161910pp. doi:10.1063/1.2361163
Taylor, P. Craig, Branz, Howard M., Collins, Robert W., Schiff, Eric A. (2008) Preface. Journal of Non-Crystalline Solids, 354 (19) doi:10.1016/j.jnoncrysol.2008.01.011
Unold, T, Reedy, R.C, Mahan, A.H (1998) Defects in hot-wire deposited amorphous silicon: results from electron spin resonance. Journal of Non-Crystalline Solids, 227. 362-366 doi:10.1016/s0022-3093(98)00227-0
Matsumura, Hideki, Umemoto, Hironobu, Masuda, Atsushi (2004) Cat-CVD (hot-wire CVD): how different from PECVD in preparing amorphous silicon. Journal of Non-Crystalline Solids, 338. 19-26 doi:10.1016/j.jnoncrysol.2004.02.014
Branz, Howard M, Reedy, Robert, Crandall, Richard S, Mahan, Harv, Xu, Yueqin, Nelson, Brent P (2002) Fermi-level dependence of the charge state of diffusing hydrogen in amorphous silicon. Journal of Non-Crystalline Solids, 299. 191-195 doi:10.1016/s0022-3093(01)01161-9
Brinza, M., van der Werf, C.H.M., Rath, J.K., Schropp, R.E.I. (2008) Optoelectronic properties of hot-wire silicon layers deposited at 100°C. Journal of Non-Crystalline Solids, 354 (19) 2248-2252 doi:10.1016/j.jnoncrysol.2007.10.043
Kosarev, A., Moreno, M., Torres, A., Zuniga, C. (2008) IR sensors based on silicon–germanium–boron alloys deposited by plasma: Fabrication and characterization. Journal of Non-Crystalline Solids, 354 (19) 2561-2564 doi:10.1016/j.jnoncrysol.2007.10.100
Moreno, M., Kosarev, A., Torres, A., Juarez, I. (2008) Arrays of un-cooled micro-bolometers based on amorphous silicon–germanium thin films deposited by plasma. Journal of Non-Crystalline Solids, 354 (19) 2552-2555 doi:10.1016/j.jnoncrysol.2007.09.039
Moreno, M., Kosarev, A., Torres, A., Ambrosio, R. (2008) Comparison of three un-cooled micro-bolometers configurations based on amorphous silicon–germanium thin films deposited by plasma. Journal of Non-Crystalline Solids, 354 (19) 2598-2602 doi:10.1016/j.jnoncrysol.2007.09.116
 
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