Chu, Yen-Ho, Lee, Chien-Chieh, Chang, Teng-Hsiang, Hsieh, Yu-Lin, Liu, Shian-Ming, Chang, Jenq-Yang, Li, Tomi T., Chen, I-Chen (2015) Investigation of interface quality and passivation improvement with a-SiO:H deposited by ECRCVD at low temperature. Journal of Non-Crystalline Solids, 412. 5-10 doi:10.1016/j.jnoncrysol.2014.12.032
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Investigation of interface quality and passivation improvement with a-SiO:H deposited by ECRCVD at low temperature | ||
Journal | Journal of Non-Crystalline Solids | ||
Authors | Chu, Yen-Ho | Author | |
Lee, Chien-Chieh | Author | ||
Chang, Teng-Hsiang | Author | ||
Hsieh, Yu-Lin | Author | ||
Liu, Shian-Ming | Author | ||
Chang, Jenq-Yang | Author | ||
Li, Tomi T. | Author | ||
Chen, I-Chen | Author | ||
Year | 2015 (March) | Volume | 412 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/j.jnoncrysol.2014.12.032Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 650385 | Long-form Identifier | mindat:1:5:650385:1 |
GUID | 0 | ||
Full Reference | Chu, Yen-Ho, Lee, Chien-Chieh, Chang, Teng-Hsiang, Hsieh, Yu-Lin, Liu, Shian-Ming, Chang, Jenq-Yang, Li, Tomi T., Chen, I-Chen (2015) Investigation of interface quality and passivation improvement with a-SiO:H deposited by ECRCVD at low temperature. Journal of Non-Crystalline Solids, 412. 5-10 doi:10.1016/j.jnoncrysol.2014.12.032 | ||
Plain Text | Chu, Yen-Ho, Lee, Chien-Chieh, Chang, Teng-Hsiang, Hsieh, Yu-Lin, Liu, Shian-Ming, Chang, Jenq-Yang, Li, Tomi T., Chen, I-Chen (2015) Investigation of interface quality and passivation improvement with a-SiO:H deposited by ECRCVD at low temperature. Journal of Non-Crystalline Solids, 412. 5-10 doi:10.1016/j.jnoncrysol.2014.12.032 | ||
In | (2015) Journal of Non-Crystalline Solids Vol. 412. Elsevier BV |
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