Sato, Masanori, King, Sean W., Lanford, William A., Henry, Patrick, Fujiseki, Takemasa, Fujiwara, Hiroyuki (2016) Network structure of a-SiO:H layers fabricated by plasma-enhanced chemical vapor deposition: Comparison with a-SiC:H layers. Journal of Non-Crystalline Solids, 440. 49-58 doi:10.1016/j.jnoncrysol.2016.03.004
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Network structure of a-SiO:H layers fabricated by plasma-enhanced chemical vapor deposition: Comparison with a-SiC:H layers | ||
Journal | Journal of Non-Crystalline Solids | ||
Authors | Sato, Masanori | Author | |
King, Sean W. | Author | ||
Lanford, William A. | Author | ||
Henry, Patrick | Author | ||
Fujiseki, Takemasa | Author | ||
Fujiwara, Hiroyuki | Author | ||
Year | 2016 (May) | Volume | 440 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/j.jnoncrysol.2016.03.004Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 650955 | Long-form Identifier | mindat:1:5:650955:6 |
GUID | 0 | ||
Full Reference | Sato, Masanori, King, Sean W., Lanford, William A., Henry, Patrick, Fujiseki, Takemasa, Fujiwara, Hiroyuki (2016) Network structure of a-SiO:H layers fabricated by plasma-enhanced chemical vapor deposition: Comparison with a-SiC:H layers. Journal of Non-Crystalline Solids, 440. 49-58 doi:10.1016/j.jnoncrysol.2016.03.004 | ||
Plain Text | Sato, Masanori, King, Sean W., Lanford, William A., Henry, Patrick, Fujiseki, Takemasa, Fujiwara, Hiroyuki (2016) Network structure of a-SiO:H layers fabricated by plasma-enhanced chemical vapor deposition: Comparison with a-SiC:H layers. Journal of Non-Crystalline Solids, 440. 49-58 doi:10.1016/j.jnoncrysol.2016.03.004 | ||
In | (2016) Journal of Non-Crystalline Solids Vol. 440. Elsevier BV |
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