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Reiser, Arnost, Shih, Hsiao-Yi, Yeh, Tung-Feng, Huang, Jian-Ping (1996) Novolak-Diazochinon-Photoresiste: abbildende Systeme für den Computerchip. Angewandte Chemie, 108 (21). 2610-2622 doi:10.1002/ange.19961082105

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Reference TypeJournal (article/letter/editorial)
TitleNovolak-Diazochinon-Photoresiste: abbildende Systeme für den Computerchip
JournalAngewandte Chemie
AuthorsReiser, ArnostAuthor
Shih, Hsiao-YiAuthor
Yeh, Tung-FengAuthor
Huang, Jian-PingAuthor
Year1996 (November 6)Volume108
Issue21
PublisherWiley
DOIdoi:10.1002/ange.19961082105Search in ResearchGate
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Mindat Ref. ID7292977Long-form Identifiermindat:1:5:7292977:9
GUID0
Full ReferenceReiser, Arnost, Shih, Hsiao-Yi, Yeh, Tung-Feng, Huang, Jian-Ping (1996) Novolak-Diazochinon-Photoresiste: abbildende Systeme für den Computerchip. Angewandte Chemie, 108 (21). 2610-2622 doi:10.1002/ange.19961082105
Plain TextReiser, Arnost, Shih, Hsiao-Yi, Yeh, Tung-Feng, Huang, Jian-Ping (1996) Novolak-Diazochinon-Photoresiste: abbildende Systeme für den Computerchip. Angewandte Chemie, 108 (21). 2610-2622 doi:10.1002/ange.19961082105
In(1996, November) Angewandte Chemie Vol. 108 (21) Wiley

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Yeh, Tung Feng, Shih, Hsiao Yi, Reiser, Arnost (1992) Percolation view of novolak dissolution and dissolution inhibition. Macromolecules, 25. 5345-5352 doi:10.1021/ma00046a037
Shih, Hsiao-Yi, Yeh, Tung-Feng, Reiser, Arnost, Dammel, Ralph R., Merrem, Hans J., Pawlowski, Gerhard (1994) A Percolation View of Novolak Dissolution. 3. Dissolution Inhibition. Macromolecules, 27. 3330-3336 doi:10.1021/ma00090a029
Shih, Hsiao-Yi, Reiser, Arnost (1996) Percolation View of Novolak Dissolution. 5. The Dissolution of Exposed Resist Films. Macromolecules, 29. 2082-2087 doi:10.1021/ma951668e
Shih, Hsiao-Yi, Reiser, Arnost (1997) Percolation View of Novolak Dissolution. 6. The Acceleration of Novolak Dissolution by Phenolic Additives. Macromolecules, 30. 3855-3859 doi:10.1021/ma9700800
Shih, Hsiao-Yi, Reiser, Arnost (1995) A Percolation View of Novolak Dissolution. 4. Mechanism of Inhibitor Action. Macromolecules, 28. 5595-5600 doi:10.1021/ma00120a026
Shih, Hsiao-Yi, Reiser, Arnost (1997) Percolation View of Novolak Dissolution. 8. Effect of the Base Cation on Dissolution Rate. Macromolecules, 30. 4353-4356 doi:10.1021/ma970088+
Huang, Jian Ping, Kwei, T. K., Reiser, Arnost (1989) The dissolution of novolak in aqueous alkali. Macromolecules, 22. 4106-4112 doi:10.1021/ma00200a051
Shih, Hsiao-Yi, Zhuang, Huifang, Reiser, Arnost, Teraoka, Iwao, Goodman, Jonathan, Gallagher-Wetmore, Paula M. (1998) Percolation View of Novolak Dissolution. 10. Effect of Resin Molecular Weight. Macromolecules, 31. 1208-1213 doi:10.1021/ma971546h
Yeh, Tung Feng, Reiser, Arnost, Dammel, Ralph R., Pawlowski, Gerhard, Roeschert, Horst (1993) A percolation view of novolak dissolution. 2. The statistics of a three-dimensional cubic percolation field and a generalized scaling law. Macromolecules, 26. 3862-3869 doi:10.1021/ma00067a023
Rohland, (1908) Über den Estrichgips. Zeitschrift für Angewandte Chemie, 21. 108 doi:10.1002/ange.19080210305
Reiser, Oliver (1996) Die asymmetrische Aminohydroxylierung von Olefinen nach Sharpless. Angewandte Chemie, 108 (12). 1406-1408 doi:10.1002/ange.19961081207
 
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