Ballav, Nirmalya, Schilp, Soeren, Zharnikov, Michael (2008) Electron-Beam Chemical Lithography with Aliphatic Self-Assembled Monolayers. Angewandte Chemie, 120 (8). 1443-1446 doi:10.1002/ange.200704105
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Electron-Beam Chemical Lithography with Aliphatic Self-Assembled Monolayers | ||
Journal | Angewandte Chemie | ||
Authors | Ballav, Nirmalya | Author | |
Schilp, Soeren | Author | ||
Zharnikov, Michael | Author | ||
Year | 2008 (February 8) | Volume | 120 |
Issue | 8 | ||
Publisher | Wiley | ||
DOI | doi:10.1002/ange.200704105Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 7310722 | Long-form Identifier | mindat:1:5:7310722:2 |
GUID | 0 | ||
Full Reference | Ballav, Nirmalya, Schilp, Soeren, Zharnikov, Michael (2008) Electron-Beam Chemical Lithography with Aliphatic Self-Assembled Monolayers. Angewandte Chemie, 120 (8). 1443-1446 doi:10.1002/ange.200704105 | ||
Plain Text | Ballav, Nirmalya, Schilp, Soeren, Zharnikov, Michael (2008) Electron-Beam Chemical Lithography with Aliphatic Self-Assembled Monolayers. Angewandte Chemie, 120 (8). 1443-1446 doi:10.1002/ange.200704105 | ||
In | (2008, February) Angewandte Chemie Vol. 120 (8) Wiley |
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