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Aizawa, Tatsuhiko, Mitsuo, Atsushi, Akhadejdamrong, Thananan (2003) Chemical Modification of Titanium Nitride Films via Ion Implantation. MATERIALS TRANSACTIONS, 44 (10). 1962-1970 doi:10.2320/matertrans.44.1962

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Reference TypeJournal (article/letter/editorial)
TitleChemical Modification of Titanium Nitride Films via Ion Implantation
JournalMATERIALS TRANSACTIONS
AuthorsAizawa, TatsuhikoAuthor
Mitsuo, AtsushiAuthor
Akhadejdamrong, ThanananAuthor
Year2003Volume44
Issue10
PublisherJapan Institute of Metals
DOIdoi:10.2320/matertrans.44.1962Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID7776754Long-form Identifiermindat:1:5:7776754:5
GUID0
Full ReferenceAizawa, Tatsuhiko, Mitsuo, Atsushi, Akhadejdamrong, Thananan (2003) Chemical Modification of Titanium Nitride Films via Ion Implantation. MATERIALS TRANSACTIONS, 44 (10). 1962-1970 doi:10.2320/matertrans.44.1962
Plain TextAizawa, Tatsuhiko, Mitsuo, Atsushi, Akhadejdamrong, Thananan (2003) Chemical Modification of Titanium Nitride Films via Ion Implantation. MATERIALS TRANSACTIONS, 44 (10). 1962-1970 doi:10.2320/matertrans.44.1962
In(2003) MATERIALS TRANSACTIONS Vol. 44 (10) Japan Institute of Metals


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