Reference Type | Journal (article/letter/editorial) |
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Title | Fabrication of Silicon Nitride Thick Coatings by Reactive RF Plasma Spraying |
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Journal | MATERIALS TRANSACTIONS |
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Authors | Yamada, Motohiro | Author |
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Inamoto, Tatsuya | Author |
Fukumoto, Masahiro | Author |
Yasui, Toshiaki | Author |
Year | 2004 | Volume | 45 |
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Issue | 12 |
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Publisher | Japan Institute of Metals |
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DOI | doi:10.2320/matertrans.45.3304Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 7777264 | Long-form Identifier | mindat:1:5:7777264:4 |
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GUID | 0 |
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Full Reference | Yamada, Motohiro, Inamoto, Tatsuya, Fukumoto, Masahiro, Yasui, Toshiaki (2004) Fabrication of Silicon Nitride Thick Coatings by Reactive RF Plasma Spraying. MATERIALS TRANSACTIONS, 45 (12). 3304-3308 doi:10.2320/matertrans.45.3304 |
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Plain Text | Yamada, Motohiro, Inamoto, Tatsuya, Fukumoto, Masahiro, Yasui, Toshiaki (2004) Fabrication of Silicon Nitride Thick Coatings by Reactive RF Plasma Spraying. MATERIALS TRANSACTIONS, 45 (12). 3304-3308 doi:10.2320/matertrans.45.3304 |
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In | (2004) MATERIALS TRANSACTIONS Vol. 45 (12) Japan Institute of Metals |
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