Matsuo, Naoto, Takanashi, Yasuyuki, Heya, Akira, Kanda, Kazuhiro (2009) Si Atom Movement on a-Si Film Surface by Soft X-ray Excitation Using Undulators Source. Journal of the Japan Institute of Metals, 73 (9). 708-712 doi:10.2320/jinstmet.73.708
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Si Atom Movement on a-Si Film Surface by Soft X-ray Excitation Using Undulators Source | ||
Journal | Journal of the Japan Institute of Metals | ||
Authors | Matsuo, Naoto | Author | |
Takanashi, Yasuyuki | Author | ||
Heya, Akira | Author | ||
Kanda, Kazuhiro | Author | ||
Year | 2009 | Volume | 73 |
Issue | 9 | ||
Publisher | Japan Institute of Metals | ||
DOI | doi:10.2320/jinstmet.73.708Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 7816863 | Long-form Identifier | mindat:1:5:7816863:5 |
GUID | 0 | ||
Full Reference | Matsuo, Naoto, Takanashi, Yasuyuki, Heya, Akira, Kanda, Kazuhiro (2009) Si Atom Movement on a-Si Film Surface by Soft X-ray Excitation Using Undulators Source. Journal of the Japan Institute of Metals, 73 (9). 708-712 doi:10.2320/jinstmet.73.708 | ||
Plain Text | Matsuo, Naoto, Takanashi, Yasuyuki, Heya, Akira, Kanda, Kazuhiro (2009) Si Atom Movement on a-Si Film Surface by Soft X-ray Excitation Using Undulators Source. Journal of the Japan Institute of Metals, 73 (9). 708-712 doi:10.2320/jinstmet.73.708 | ||
In | (2009) Journal of the Japan Institute of Metals Vol. 73 (9) Japan Institute of Metals |
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