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Tellier, C R, Pichard, C R, Tosser, A J (1979) Approximate expressions for the product of the resistivity and its TCR in very thin polycrystalline films. Journal of Physics F: Metal Physics, 9 (12). 2377-2380 doi:10.1088/0305-4608/9/12/010

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Reference TypeJournal (article/letter/editorial)
TitleApproximate expressions for the product of the resistivity and its TCR in very thin polycrystalline films
JournalJournal of Physics F: Metal Physics
AuthorsTellier, C RAuthor
Pichard, C RAuthor
Tosser, A JAuthor
Year1979 (December)Volume9
Issue12
PublisherIOP Publishing
DOIdoi:10.1088/0305-4608/9/12/010Search in ResearchGate
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Mindat Ref. ID7976713Long-form Identifiermindat:1:5:7976713:2
GUID0
Full ReferenceTellier, C R, Pichard, C R, Tosser, A J (1979) Approximate expressions for the product of the resistivity and its TCR in very thin polycrystalline films. Journal of Physics F: Metal Physics, 9 (12). 2377-2380 doi:10.1088/0305-4608/9/12/010
Plain TextTellier, C R, Pichard, C R, Tosser, A J (1979) Approximate expressions for the product of the resistivity and its TCR in very thin polycrystalline films. Journal of Physics F: Metal Physics, 9 (12). 2377-2380 doi:10.1088/0305-4608/9/12/010
In(1979, December) Journal of Physics F: Metal Physics Vol. 9 (12) IOP Publishing

See Also

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Pichard, C R, Tellier, C R, Tosser, A J (1980) Thermoelectric power of thin polycrystalline metal films in an effective mean free path model. Journal of Physics F: Metal Physics, 10 (9). 2009-2014 doi:10.1088/0305-4608/10/9/016
Pichard, C R, Tellier, C R, Tosser, A J (1979) Decomposition of polycrystalline metallic film resistivity from Mathiessen's rule. Journal of Physics D: Applied Physics, 12. doi:10.1088/0022-3727/12/9/001
Pichard, C R, Tellier, C R, Tosser, A J (1980) Relation between the metal film resistivity, its temperature coefficient of resistivity and its Hall coefficient in a grain boundary conduction model. Journal of Physics F: Metal Physics, 10 (3). doi:10.1088/0305-4608/10/3/002
Tellier, C. R., Pichard, C. R., Tosser, A. J. (1981) Three-dimensional strain coefficients of resistivity of thin polycrystalline metal films. Journal of Materials Science, 16. 2281-2286 doi:10.1007/bf00542391
Pichard, C. R., Vatamanyuk, V. I., Khalid-Naciri, A., Tellier, C. R., Tosser, A. J. (1984) The theoretical values for the resistivity, the tcr and the Hall coefficient of thin columnar and polycrystalline films. Journal of Materials Science Letters, 3 (5) 447-450 doi:10.1007/bf00724389
Kayeh, M, Wiser, N, Leavens, C R (1979) Validity of empirical expressions for the low-temperature electrical resistivity. Journal of Physics F: Metal Physics, 9 (1). 71-78 doi:10.1088/0305-4608/9/1/010
Pichard, C. R., Tellier, C. R., Tosser, A. J. (1980) Three-dimensional analytical expressions of strain gauge coefficients of infinitely thick polycrystalline metal films. Journal of Materials Science, 15. 2991-2994 doi:10.1007/bf00550366
Tellier, C R, Rabel, M, Tosser, A J (1978) Hall coefficient of thin films in a mean free path model. Journal of Physics F: Metal Physics, 8 (11). 2357-2365 doi:10.1088/0305-4608/8/11/019
Pichard, C. R., Tosser, A. J., Tellier, C. R. (1982) Thermoelectric power of supported thin polycrystalline films. Journal of Materials Science, 17. 10-16 doi:10.1007/bf00809029
Pichard, C. R., Tosser, A. J., Tellier, C. R. (1981) Theoretical analysis of the Hall effect in thin polycrystalline metallic films. Journal of Materials Science, 16. 451-456 doi:10.1007/bf00738636
Pichard, C R, Tellier, C R, Tosser, A J (1980) Thermal strains in thin metallic films. Journal of Physics D: Applied Physics, 13. 1325-1329 doi:10.1088/0022-3727/13/7/028
 
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