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Gómez-Aleixandre, C., Essafti, A., Fernández, M., Fierro, J. L. G., Albella, J. M. (1996) Influence of Diborane Flow Rate on the Structure and Stability of CVD Boron Nitride Films. The Journal of Physical Chemistry, 100 (6). 2148-2153 doi:10.1021/jp951200d

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of Diborane Flow Rate on the Structure and Stability of CVD Boron Nitride Films
JournalThe Journal of Physical Chemistry
AuthorsGómez-Aleixandre, C.Author
Essafti, A.Author
Fernández, M.Author
Fierro, J. L. G.Author
Albella, J. M.Author
Year1996 (January)Volume100
Issue6
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/jp951200dSearch in ResearchGate
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Mindat Ref. ID8045144Long-form Identifiermindat:1:5:8045144:0
GUID0
Full ReferenceGómez-Aleixandre, C., Essafti, A., Fernández, M., Fierro, J. L. G., Albella, J. M. (1996) Influence of Diborane Flow Rate on the Structure and Stability of CVD Boron Nitride Films. The Journal of Physical Chemistry, 100 (6). 2148-2153 doi:10.1021/jp951200d
Plain TextGómez-Aleixandre, C., Essafti, A., Fernández, M., Fierro, J. L. G., Albella, J. M. (1996) Influence of Diborane Flow Rate on the Structure and Stability of CVD Boron Nitride Films. The Journal of Physical Chemistry, 100 (6). 2148-2153 doi:10.1021/jp951200d
In(1996, January) The Journal of Physical Chemistry Vol. 100 (6) American Chemical Society (ACS)

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Gómez-Aleixandre, C., Essafti, A., Albella, J. M. (2000) Kinetic Study of the Diborane/Methylamine Reaction:  Composition and Structure of C−B−N Films. The Journal of Physical Chemistry B, 104 (18). 4397-4402 doi:10.1021/jp9929723
Gómez-Aleixandre, C., Sánchez, O., Vázquez, L., García, M. M., Albella, J. M. (1996) Influence of Methane Concentration on the Nucleation and Growth Stages in Diamond Film Deposition. physica status solidi (a), 154 (1). 23-32 doi:10.1002/pssa.2211540104
Tabarés, F L, Ferreira, J A, Tafalla, D, Tanarro, I, Herrero, V J, Méndez, I, Gómez-Aleixandre, C, Albella, J M (2008) Cleaning efficiency of carbon films by oxygen plasmas in the presence of metallic getters. Journal of Physics: Conference Series, 100. 62025pp. doi:10.1088/1742-6596/100/6/062025
Martí, F. J., Castro, A., Olivares, J., Gómez-Aleixandre, C., Albella, J. M. (1999) Deposition of ternary silicon based compounds by CVD techniques. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999813
Camero, M., Buijnsters, J. G., Gómez-Aleixandre, C., Gago, R., Caretti, I., Jiménez, I. (2007) The effect of nitrogen incorporation on the bonding structure of hydrogenated carbon nitride films. Journal of Applied Physics, 101 (6). 63515pp. doi:10.1063/1.2712142
Gomez-Aleixandre, C., Sanch Ez-Garrido, O., Martinez-Duart, J. M., Albella, J. M. (1991) Silicon nitride films deposited from SiF4/NH3 gas mixtures. Journal of Materials Science, 26. 4683-4686 doi:10.1007/bf00612406
Fernández-García, M., Anderson, J. A., Haller, G. L. (1996) Alloy Formation and Stability in Pd−Cu Bimetallic Catalysts. The Journal of Physical Chemistry, 100 (40). 16247-16254 doi:10.1021/jp9608133
Gomez-Aleixandre, Cristina, Diaz, Domingo, Orgaz, Felipe, Albella, Jose M. (1993) Reaction of diborane and ammonia gas mixtures in a chemical vapor deposition hot-wall reactor. The Journal of Physical Chemistry, 97 (42). 11043-11046 doi:10.1021/j100144a023
Garcı́a, M. M., Jiménez, I., Vázquez, L., Gómez-Aleixandre, C., Albella, J. M., Sánchez, O., Terminello, L. J., Himpsel, F. J. (1998) X-ray absorption spectroscopy and atomic force microscopy study of bias-enhanced nucleation of diamond films. Applied Physics Letters, 72 (17). 2105-2107 doi:10.1063/1.121290
Hernández-Fernández, P., Rojas, S., Ocón, P., Gómez de la Fuente, J. L., San Fabián, J., Sanza, J., Peña, M. A., García-García, F. J., Terreros, P., Fierro, J. L. G. (2007) Influence of the Preparation Route of Bimetallic Pt−Au Nanoparticle Electrocatalysts for the Oxygen Reduction Reaction. The Journal of Physical Chemistry C, 111 (7). 2913-2923 doi:10.1021/jp066812k
Gómez-Aleixandre, Cristina, Sanchez, Olga, Albella, José M., Santiso, José, Figueras, Albert (1995) CVD of Covalent Compounds and high-Tc superconductors. Advanced Materials, 7. 111-119 doi:10.1002/adma.19950070203
 
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