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Ratinen, H. (1972) Study of Film Thickness in rf Sputtering. Applied Physics Letters, 20 (12). 477-478 doi:10.1063/1.1654023

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Reference TypeJournal (article/letter/editorial)
TitleStudy of Film Thickness in rf Sputtering
JournalApplied Physics Letters
AuthorsRatinen, H.Author
Year1972 (June 15)Volume20
Issue12
PublisherAIP Publishing
DOIdoi:10.1063/1.1654023Search in ResearchGate
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Mindat Ref. ID8456106Long-form Identifiermindat:1:5:8456106:4
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Full ReferenceRatinen, H. (1972) Study of Film Thickness in rf Sputtering. Applied Physics Letters, 20 (12). 477-478 doi:10.1063/1.1654023
Plain TextRatinen, H. (1972) Study of Film Thickness in rf Sputtering. Applied Physics Letters, 20 (12). 477-478 doi:10.1063/1.1654023
In(1972, June) Applied Physics Letters Vol. 20 (12) AIP Publishing

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Ratinen, H. (1972) Analysis of rf‐sputtering glow discharge by spectroscopic method. Applied Physics Letters, 21 (10). 473-476 doi:10.1063/1.1654223
Ratinen, H. (1973) Luminescence of rf‐sputtered oxide films during sputtering. Journal of Applied Physics, 44 (9). 3817-3820 doi:10.1063/1.1662855
Johnson, L. F., Guggenheim, H. J. (1972) New Laser Lines in the Visible from Er3+Ions in BaY2F8. Applied Physics Letters, 20 (12). 474-477 doi:10.1063/1.1654022
Ratinen, H. (1973) Determination of the sputtering rate by the fluorescence of sputtered atoms. Journal of Applied Physics, 44 (6). 2730-2734 doi:10.1063/1.1662641
Cuomo, J.J., Sadagopan, V., DeLuca, J., Chaudhari, P., Rosenberg, R. (1972) Growth of uniaxial magnetic garnet films by rf sputtering. Applied Physics Letters, 21 (12). 581-584 doi:10.1063/1.1654264
Takada, S., Ohnishi, M., Hayakawa, H., Mikoshiba, N. (1974) Optical waveguides of single‐crystal LiNbO3 film deposited by rf sputtering. Applied Physics Letters, 24 (10). 490-492 doi:10.1063/1.1655024
Coburn, J. W., Kay, Eric (1972) Positive‐ion bombardment of substrates in rf diode glow discharge sputtering. Journal of Applied Physics, 43 (12). 4965-4971 doi:10.1063/1.1661054
Ratinen, H. (1974) Luminescent properties of lanthanide ions in alkaline-earth-oxide films prepared by RF sputtering. physica status solidi (a), 21 (2). doi:10.1002/pssa.2210210259
Carcia, P. F., McLean, R. S., Reilly, M. H., Nunes, G. (2003) Transparent ZnO thin-film transistor fabricated by rf magnetron sputtering. Applied Physics Letters, 82 (7). 1117-1119 doi:10.1063/1.1553997
Heimann, P. A., Simpson, J. H. (1980) Analysis of the dark film in rf‐excited mercury lamps. Applied Physics Letters, 36 (12). 963-964 doi:10.1063/1.91383
Akoh, H., Shinoki, F., Takahashi, M., Takada, S. (1988) Thickness dependence of superconductivity in rf‐sputtered Y‐Ba‐Cu‐O thin films. Applied Physics Letters, 52 (20). 1732-1734 doi:10.1063/1.99715
 
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