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Waterhouse, Neil (1972) Erratum: Layering in Sputtered Tantalum Films. Applied Physics Letters, 20 (5). 204 doi:10.1063/1.1654109

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Reference TypeJournal (article/letter/editorial)
TitleErratum: Layering in Sputtered Tantalum Films
JournalApplied Physics Letters
AuthorsWaterhouse, NeilAuthor
Year1972 (March)Volume20
Issue5
PublisherAIP Publishing
DOIdoi:10.1063/1.1654109Search in ResearchGate
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Mindat Ref. ID8456286Long-form Identifiermindat:1:5:8456286:9
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Full ReferenceWaterhouse, Neil (1972) Erratum: Layering in Sputtered Tantalum Films. Applied Physics Letters, 20 (5). 204 doi:10.1063/1.1654109
Plain TextWaterhouse, Neil (1972) Erratum: Layering in Sputtered Tantalum Films. Applied Physics Letters, 20 (5). 204 doi:10.1063/1.1654109
In(1972, March) Applied Physics Letters Vol. 20 (5) AIP Publishing

See Also

These are possibly similar items as determined by title/reference text matching only.

Waterhouse, Neil (1971) Layering in Sputtered Tantalum Films. Applied Physics Letters, 19 (10). 375-378 doi:10.1063/1.1653735
Waterhouse, Neil (1972) Variation with Depth of the Electrical Properties of Sputtered Tantalum Films. Journal of Applied Physics, 43 (4). 1498-1504 doi:10.1063/1.1661349
Westwood, W. D., Waterhouse, Neil (1971) Structural and Electrical Properties of Tantalum Films Sputtered in Oxygen‐Argon Mixtures. Journal of Applied Physics, 42 (7). 2946-2952 doi:10.1063/1.1660653
Waterhouse, Neil, Wilcox, Philip S., Willmott, David J. (1971) Effect of Oxygen on the Electrical and Structural Properties of Triode‐Sputtered Tantalum Films. Journal of Applied Physics, 42 (13). 5649-5653 doi:10.1063/1.1659995
Waterhouse, Neil, Westwood, William D. (1971) Effect of Oxygen on the Temperature Dependence of Electrical Properties of Reactively Sputtered Tantalum Films. Canadian Journal of Physics, 49. 2250-2263 doi:10.1139/p71-273
Stein, C. R., Kashnow, R. A. (1972) Erratum: A Two‐Frequency Coincidence Addressing Scheme for Nematic‐Liquid‐Crystal Displays. Applied Physics Letters, 20 (5). 204 doi:10.1063/1.1654110
Logothetis, E. M., Holloway, H., Varga, A. J., Wilkes, E. (1972) Erratum: Infrared Detection by Schottky Barriers on Epitaxial PbTe. Applied Physics Letters, 20 (5). 204 doi:10.1063/1.1654111
Buvinger, E. A. (1965) ANALYSIS OF THIN FILMS OF TANTALUM REACTIVELY SPUTTERED IN NITROGEN ATMOSPHERE. Applied Physics Letters, 7 (1). 14-15 doi:10.1063/1.1754232
Willmott, David J. (1972) Effect of nitrogen on the electrical and structural properties of triode‐sputtered tantalum films. Journal of Applied Physics, 43 (12). 4865-4871 doi:10.1063/1.1661039
Ishiyama, Kengo, Taga, Yasunori (1991) Ejection angle dependence of electrical properties of ion beam sputtered tantalum oxide films. Applied Physics Letters, 58 (6). 577-579 doi:10.1063/1.104592
Hickmott, T. W. (1972) Thermoluminescence and Color Centers in rf‐Sputtered SiO2 Films. Journal of Applied Physics, 43 (5). 2339-2351 doi:10.1063/1.1661501
 
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