Reference Type | Journal (article/letter/editorial) |
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Title | Swelling behaviour of poly(methylmethacrylate) thick resist layers in deep X-ray lithography |
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Journal | Journal of Synchrotron Radiation |
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Authors | Khan Malek, C. | Author |
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Das, S. | Author |
Year | 2003 (May 1) | Volume | 10 |
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Issue | 3 |
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Publisher | International Union of Crystallography (IUCr) |
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DOI | doi:10.1107/s0909049503005971Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8484684 | Long-form Identifier | mindat:1:5:8484684:0 |
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GUID | 0 |
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Full Reference | Khan Malek, C., Das, S. (2003) Swelling behaviour of poly(methylmethacrylate) thick resist layers in deep X-ray lithography. Journal of Synchrotron Radiation, 10 (3). 272-279 doi:10.1107/s0909049503005971 |
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Plain Text | Khan Malek, C., Das, S. (2003) Swelling behaviour of poly(methylmethacrylate) thick resist layers in deep X-ray lithography. Journal of Synchrotron Radiation, 10 (3). 272-279 doi:10.1107/s0909049503005971 |
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In | (2003, May) Journal of Synchrotron Radiation Vol. 10 (3) International Union of Crystallography (IUCr) |
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