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Wie, C. R., Chen, J. C., Kim, H. M., Liu, P. L., Choi, Y.‐W., Hwang, D. M. (1989) X‐ray interference measurement of ultrathin semiconductor layers. Applied Physics Letters, 55 (17). 1774-1776 doi:10.1063/1.102189

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Reference TypeJournal (article/letter/editorial)
TitleX‐ray interference measurement of ultrathin semiconductor layers
JournalApplied Physics Letters
AuthorsWie, C. R.Author
Chen, J. C.Author
Kim, H. M.Author
Liu, P. L.Author
Choi, Y.‐W.Author
Hwang, D. M.Author
Year1989 (October 23)Volume55
Issue17
PublisherAIP Publishing
DOIdoi:10.1063/1.102189Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8488220Long-form Identifiermindat:1:5:8488220:4
GUID0
Full ReferenceWie, C. R., Chen, J. C., Kim, H. M., Liu, P. L., Choi, Y.‐W., Hwang, D. M. (1989) X‐ray interference measurement of ultrathin semiconductor layers. Applied Physics Letters, 55 (17). 1774-1776 doi:10.1063/1.102189
Plain TextWie, C. R., Chen, J. C., Kim, H. M., Liu, P. L., Choi, Y.‐W., Hwang, D. M. (1989) X‐ray interference measurement of ultrathin semiconductor layers. Applied Physics Letters, 55 (17). 1774-1776 doi:10.1063/1.102189
In(1989, October) Applied Physics Letters Vol. 55 (17) AIP Publishing

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