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Sivoththaman, S., Laureys, W., Nijs, J., Mertens, R. (1997) Rapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation. Applied Physics Letters, 71 (3). 392-394 doi:10.1063/1.119547

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Reference TypeJournal (article/letter/editorial)
TitleRapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation
JournalApplied Physics Letters
AuthorsSivoththaman, S.Author
Laureys, W.Author
Nijs, J.Author
Mertens, R.Author
Year1997 (July 21)Volume71
Issue3
PublisherAIP Publishing
DOIdoi:10.1063/1.119547Search in ResearchGate
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Mindat Ref. ID8520245Long-form Identifiermindat:1:5:8520245:0
GUID0
Full ReferenceSivoththaman, S., Laureys, W., Nijs, J., Mertens, R. (1997) Rapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation. Applied Physics Letters, 71 (3). 392-394 doi:10.1063/1.119547
Plain TextSivoththaman, S., Laureys, W., Nijs, J., Mertens, R. (1997) Rapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation. Applied Physics Letters, 71 (3). 392-394 doi:10.1063/1.119547
In(1997, July) Applied Physics Letters Vol. 71 (3) AIP Publishing

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Lerch, W. (1996) Ion Implantation and Rapid Thermal Annealing in Synergy for Shallow Junction Formation. physica status solidi (a), 158 (1). 117-136 doi:10.1002/pssa.2211580115
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