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Pecher, P., Jacob, W. (1998) Determination of the absolute CH3 radical flux emanating from a methane electron cyclotron resonance plasma. Applied Physics Letters, 73 (1). 31-33 doi:10.1063/1.121713

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Reference TypeJournal (article/letter/editorial)
TitleDetermination of the absolute CH3 radical flux emanating from a methane electron cyclotron resonance plasma
JournalApplied Physics Letters
AuthorsPecher, P.Author
Jacob, W.Author
Year1998 (July 6)Volume73
Issue1
PublisherAIP Publishing
DOIdoi:10.1063/1.121713Search in ResearchGate
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Mindat Ref. ID8521708Long-form Identifiermindat:1:5:8521708:1
GUID0
Full ReferencePecher, P., Jacob, W. (1998) Determination of the absolute CH3 radical flux emanating from a methane electron cyclotron resonance plasma. Applied Physics Letters, 73 (1). 31-33 doi:10.1063/1.121713
Plain TextPecher, P., Jacob, W. (1998) Determination of the absolute CH3 radical flux emanating from a methane electron cyclotron resonance plasma. Applied Physics Letters, 73 (1). 31-33 doi:10.1063/1.121713
In(1998, July) Applied Physics Letters Vol. 73 (1) AIP Publishing

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Jacob, W., Engelhard, M., Möller, W., Koch, A. (1994) Absolute density determination of CH radicals in a methane plasma. Applied Physics Letters, 64 (8). 971-973 doi:10.1063/1.110949
Racine, B., Benlahsen, M., Zellama, K., Goudeau, P., Zarrabian, M., Turban, G. (1998) Effect of the hydrogen on the intrinsic stress in hydrogenated amorphous carbon films deposited from an electron cyclotron resonance plasma. Applied Physics Letters, 73 (22). 3226-3228 doi:10.1063/1.122726
Tani, Youji, Aoi, Yoshifumi, Kamijo, Eiji (1998) Composition and crystal structure of carbon nitride films prepared by the electron cyclotron resonance plasma sputtering method. Applied Physics Letters, 73 (12). 1652-1654 doi:10.1063/1.122235
Fan, Z. Y., Newman, N. (1998) Precise control of atomic nitrogen production in an electron cyclotron resonance plasma using N2/noble gas mixtures. Applied Physics Letters, 73 (4). 456-458 doi:10.1063/1.121898
Zaima, Kazunori, Kurihara, Kazuaki, Sasaki, Koichi (2012) Evaluation of Absolute Flux of Vacuum Ultraviolet Photons in an Electron Cyclotron Resonance Hydrogen Plasma: Comparison with Ion Flux. Japanese Journal of Applied Physics, 51. 8 doi:10.1143/jjap.51.08hc02
Zaima, Kazunori, Kurihara, Kazuaki, Sasaki, Koichi (2012) Evaluation of Absolute Flux of Vacuum Ultraviolet Photons in an Electron Cyclotron Resonance Hydrogen Plasma: Comparison with Ion Flux. Japanese Journal of Applied Physics, 51 (8) 8 doi:10.7567/jjap.51.08hc02
Li, P. W., Yang, E. S. (1993) SiGe gate oxide prepared at low‐temperatures in an electron cyclotron resonance plasma. Applied Physics Letters, 63 (21). 2938-2940 doi:10.1063/1.110790
Küttel, Olivier M., Groening, Oliver, Emmenegger, Christoph, Schlapbach, Louis (1998) Electron field emission from phase pure nanotube films grown in a methane/hydrogen plasma. Applied Physics Letters, 73 (15). 2113-2115 doi:10.1063/1.122395
Sendra, José Ramón, Anguita, José (1994) Reactive Ion Beam Etching of Indium Phosphide in Electron Cyclotron Resonance Plasma Using Methane/Hydrogen/Nitrogen Mixtures. Japanese Journal of Applied Physics, 33. doi:10.1143/jjap.33.l390
Tsuchizawa, Tai, Jin, Yoshito, Matsuo, Seitaro (1996) Kinetic‐energy measurement of a neutral stream extracted from Ar electron cyclotron resonance plasma. Applied Physics Letters, 69 (2). 149-151 doi:10.1063/1.116903
Hopwood, J., Asmussen, J. (1991) Neutral gas temperatures in a multipolar electron cyclotron resonance plasma. Applied Physics Letters, 58 (22). 2473-2475 doi:10.1063/1.105232
 
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