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Freitag, J. M., Clemens, B. M. (1998) Stress evolution in Mo/Si multilayers for high-reflectivity extreme ultraviolet mirrors. Applied Physics Letters, 73 (1). 43-45 doi:10.1063/1.121717

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Reference TypeJournal (article/letter/editorial)
TitleStress evolution in Mo/Si multilayers for high-reflectivity extreme ultraviolet mirrors
JournalApplied Physics Letters
AuthorsFreitag, J. M.Author
Clemens, B. M.Author
Year1998 (July 6)Volume73
Issue1
PublisherAIP Publishing
DOIdoi:10.1063/1.121717Search in ResearchGate
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Mindat Ref. ID8521712Long-form Identifiermindat:1:5:8521712:4
GUID0
Full ReferenceFreitag, J. M., Clemens, B. M. (1998) Stress evolution in Mo/Si multilayers for high-reflectivity extreme ultraviolet mirrors. Applied Physics Letters, 73 (1). 43-45 doi:10.1063/1.121717
Plain TextFreitag, J. M., Clemens, B. M. (1998) Stress evolution in Mo/Si multilayers for high-reflectivity extreme ultraviolet mirrors. Applied Physics Letters, 73 (1). 43-45 doi:10.1063/1.121717
In(1998, July) Applied Physics Letters Vol. 73 (1) AIP Publishing

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Freitag, J. M., Clemens, B. M. (2001) Nonspecular x-ray reflectivity study of roughness scaling in Si/Mo multilayers. Journal of Applied Physics, 89 (2). 1101-1107 doi:10.1063/1.1332095
Singh, Mandeep, Braat, Joseph J. M. (2000) Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity. Applied Optics, 39. 2189pp. doi:10.1364/ao.39.002189
Braun, Stefan, Mai, Hermann, Moss, Matthew, Scholz, Roland, Leson, Andreas (2002) Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors. Japanese Journal of Applied Physics, 41. 4074-4081 doi:10.1143/jjap.41.4074
Fayeulle, S., Nastasi, M. (1998) Stress-related interdiffusion in dc sputtered TiN/B–C–N multilayers. Applied Physics Letters, 73 (8). 1077-1079 doi:10.1063/1.122089
Ravet, M. F., Bridou, F., Raynal, A., Pardo, B., Chauvineau, J. P., André, J.-M. (2001) B/Si multilayers for soft x-ray and extreme ultraviolet optics. Journal of Applied Physics, 89 (2). 1145-1150 doi:10.1063/1.1322590
Slaughter, J. M., Schulze, Dean W., Hills, C. R., Mirone, A., Stalio, R., Watts, R. N., Tarrio, C., Lucatorto, T. B., Krumrey, M., Mueller, P., Falco, Charles M. (1994) Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet. Journal of Applied Physics, 76 (4). 2144-2156 doi:10.1063/1.357626
Kanjilal, A., Catalfano, M., Harilal, S. S., Hassanein, A., Rice, B. (2012) Time dependent changes in extreme ultraviolet reflectivity of Ru mirrors from electron-induced surface chemistry. Journal of Applied Physics, 111 (6). 63518pp. doi:10.1063/1.3691604
Kloidt, A., Nolting, K., Kleineberg, U., Schmiedeskamp, B., Heinzmann, U., Müller, P., Kühne, M. (1991) Enhancement of the reflectivity of Mo/Si multilayer x‐ray mirrors by thermal treatment. Applied Physics Letters, 58 (23). 2601-2603 doi:10.1063/1.104835
Montcalm, Claude, Sullivan, Brian T., Pépin, Henri, Dobrowolski, J. A., Sutton, M. (1994) Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering. Applied Optics, 33. 2057pp. doi:10.1364/ao.33.002057
Mirkarimi, P. B., Stearns, D. G., Baker, S. L., Elmer, J. W., Sweeney, D. W., Gullikson, E. M. (2002) Method for repairing Mo/Si multilayer thin film phase defects in reticles for extreme ultraviolet lithography. Journal of Applied Physics, 91 (1). 81pp. doi:10.1063/1.1419265
Stock, H.‐J., Kleineberg, U., Kloidt, A., Schmiedeskamp, B., Heinzmann, Ü., Krumrey, M., Müller, P., Scholze, F. (1993) Mo0.5Si0.5/Si multilayer soft x‐ray mirrors, high thermal stability, and normal incidence reflectivity. Applied Physics Letters, 63 (16). 2207-2209 doi:10.1063/1.110529
 
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