Reference Type | Journal (article/letter/editorial) |
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Title | SiO2/6H-SiC(0001)3×3 initial interface formation by Si overlayer oxidation |
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Journal | Applied Physics Letters |
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Authors | Amy, F. | Author |
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Soukiassian, P. | Author |
Hwu, Y.-K. | Author |
Brylinski, C. | Author |
Year | 1999 (November 22) | Volume | 75 |
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Issue | 21 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.125351Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8525083 | Long-form Identifier | mindat:1:5:8525083:7 |
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GUID | 0 |
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Full Reference | Amy, F., Soukiassian, P., Hwu, Y.-K., Brylinski, C. (1999) SiO2/6H-SiC(0001)3×3 initial interface formation by Si overlayer oxidation. Applied Physics Letters, 75 (21). 3360-3362 doi:10.1063/1.125351 |
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Plain Text | Amy, F., Soukiassian, P., Hwu, Y.-K., Brylinski, C. (1999) SiO2/6H-SiC(0001)3×3 initial interface formation by Si overlayer oxidation. Applied Physics Letters, 75 (21). 3360-3362 doi:10.1063/1.125351 |
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In | (1999, November) Applied Physics Letters Vol. 75 (21) AIP Publishing |
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