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Ramanathan, Shriram, McIntyre, Paul C. (2002) Ultrathin zirconia/SiO2 dielectric stacks grown by ultraviolet–ozone oxidation. Applied Physics Letters, 80 (20). 3793-3795 doi:10.1063/1.1481241

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Reference TypeJournal (article/letter/editorial)
TitleUltrathin zirconia/SiO2 dielectric stacks grown by ultraviolet–ozone oxidation
JournalApplied Physics Letters
AuthorsRamanathan, ShriramAuthor
McIntyre, Paul C.Author
Year2002 (May 20)Volume80
Issue20
PublisherAIP Publishing
DOIdoi:10.1063/1.1481241Search in ResearchGate
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Mindat Ref. ID8532083Long-form Identifiermindat:1:5:8532083:5
GUID0
Full ReferenceRamanathan, Shriram, McIntyre, Paul C. (2002) Ultrathin zirconia/SiO2 dielectric stacks grown by ultraviolet–ozone oxidation. Applied Physics Letters, 80 (20). 3793-3795 doi:10.1063/1.1481241
Plain TextRamanathan, Shriram, McIntyre, Paul C. (2002) Ultrathin zirconia/SiO2 dielectric stacks grown by ultraviolet–ozone oxidation. Applied Physics Letters, 80 (20). 3793-3795 doi:10.1063/1.1481241
In(2002, May) Applied Physics Letters Vol. 80 (20) AIP Publishing

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Ramanathan, Shriram, Park, Chang-Man, McIntyre, Paul C. (2002) Electrical properties of thin film zirconia grown by ultraviolet ozone oxidation. Journal of Applied Physics, 91 (7). 4521-4527 doi:10.1063/1.1459103
Ramanathan, Shriram, Wilk, Glen D., Muller, David A., Park, Chang-Man, McIntyre, Paul C. (2001) Growth and characterization of ultrathin zirconia dielectrics grown by ultraviolet ozone oxidation. Applied Physics Letters, 79 (16). 2621-2623 doi:10.1063/1.1410871
Ramanathan, Shriram, McIntyre, Paul C., Guha, Supratik, Gusev, Evgeni (2004) Charge trapping studies on ultrathin ZrO2 and HfO2 high-k dielectrics grown by room temperature ultraviolet ozone oxidation. Applied Physics Letters, 84 (3). 389-391 doi:10.1063/1.1636532
Chi, David, Chui, Chi On, Saraswat, Krishna C., Triplett, Baylor B., McIntyre, Paul C. (2004) Zirconia grown by ultraviolet ozone oxidation on germanium (100) substrates. Journal of Applied Physics, 96 (1). 813-819 doi:10.1063/1.1745118
Ramanathan, Shriram, Chi, David, McIntyre, Paul C., Wetteland, Christopher J., Tesmer, Joseph R. (2003) Ultraviolet-Ozone Oxidation of Metal Films. Journal of the Electrochemical Society, 150. doi:10.1149/1.1566416
Ramanathan, Shriram, Muller, David A., Wilk, Glen D., Park, Chang Man, McIntyre, Paul C. (2001) Effect of oxygen stoichiometry on the electrical properties of zirconia gate dielectrics. Applied Physics Letters, 79 (20). 3311-3313 doi:10.1063/1.1418266
Tsuchiya, Masaru, Ramanathan, Shriram (2008) Synthesis and interfacial phenomena in ultra-thin yttria-doped zirconia films grown by alloy oxidation under photon irradiation. Applied Physics Letters, 92 (3). 33107pp. doi:10.1063/1.2837194
Chi, David, McIntyre, Paul C. (2004) Film and interface layer properties of ultraviolet-ozone oxidized hafnia and zirconia gate dielectrics on silicon substrates. Applied Physics Letters, 85 (20). 4699-4701 doi:10.1063/1.1814799
Ko, Changhyun, Shandalov, Michael, McIntyre, Paul C., Ramanathan, Shriram (2010) High temperature electrical conduction in nanoscale hafnia films under varying oxygen partial pressure. Applied Physics Letters, 97 (8). 82102pp. doi:10.1063/1.3482940
Tsuchiya, Masaru, Ramanathan, Shriram (2007) Effect of photon irradiation on structure of yttria-doped zirconia thin films grown on semiconductor substrates. Applied Physics Letters, 91 (25). 253104pp. doi:10.1063/1.2825567
Swaminathan, Shankar, Sun, Yun, Pianetta, Piero, McIntyre, Paul C. (2011) Ultrathin ALD-Al2O3 layers for Ge(001) gate stacks: Local composition evolution and dielectric properties. Journal of Applied Physics, 110 (9). 94105pp. doi:10.1063/1.3647761
 
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